Thin-film lithium niobate electro-optic isolator fabricated by photolithography assisted chemo-mechanical etching.

We report an electro-optic isolator fabricated on thin-film lithium niobate by photolithography-assisted chemo-mechanical etching that shows an isolation of 39.50 dB and an overall fiber-to-fiber loss of 2.6 dB.

On-chip coherent beam combination of waveguide amplifiers on Er3+-doped thin film lithium niobate.

We demonstrate on-chip coherent beam combination of two waveguide amplifiers on Er3+-doped thin film lithium niobate (Er:TFLN) platform. Our device is built based on an electro-optic modulator fabricated on Er:TFLN. The output power of the coherently combined amplifiers is measured as high as 12.9 mW, surpassing that of previous single waveguide amplifiers based on an Er3+-doped thin film lithium niobate platform.