UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films. | Nanotechnology;27(46): 465301, 2016 Nov 18. | MEDLINE

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UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films.

Lee, Keehong; Kreider, Melissa; Bai, Wubin; Cheng, Li-Chen; Dinachali, Saman Safari; Tu, Kun-Hua; Huang, Tao; Ntetsikas, K; Liontos, G; Avgeropoulos, A; Ross, C A.

Affiliation

Lee K; Department of Materials Science and Engineering, MIT, Cambridge MA 02139, USA. Semiconductor R&D Center, Samsung Electronics, Hwasung-City, Gyeonggi-do, Korea.

Nanotechnology ; 27(46): 465301, 2016 Nov 18.

Article in En | MEDLINE | ID: mdl-27736809

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Database: MEDLINE Language: En Journal: Nanotechnology Year: 2016 Type: Article

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Database: MEDLINE Language: En Journal: Nanotechnology Year: 2016 Type: Article