Chemically Homogeneous and Thermally Robust Ni1-xPtxSi Film Formed Under a Non-Equilibrium Melting/Quenching Condition.
ACS Appl Mater Interfaces
; 9(1): 566-572, 2017 Jan 11.
Article
in En
| MEDLINE
| ID: mdl-27977917
Full text:
1
Database:
MEDLINE
Language:
En
Journal:
ACS Appl Mater Interfaces
Journal subject:
BIOTECNOLOGIA
/
ENGENHARIA BIOMEDICA
Year:
2017
Type:
Article