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Carrier Trap Density Reduction at SiO2/4H-Silicon Carbide Interface with Annealing Processes in Phosphoryl Chloride and Nitride Oxide Atmospheres.
Brzozowski, Ernest; Kaminski, Maciej; Taube, Andrzej; Sadowski, Oskar; Krol, Krystian; Guziewicz, Marek.
Affiliation
  • Brzozowski E; Lukasiewicz Research Network-Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, Poland.
  • Kaminski M; Lukasiewicz Research Network-Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, Poland.
  • Taube A; Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Ul. Koszykowa 75, 00-662 Warsaw, Poland.
  • Sadowski O; Lukasiewicz Research Network-Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, Poland.
  • Krol K; Lukasiewicz Research Network-Institute of Microelectronics and Photonics, Al. Lotników 32/46, 02-668 Warsaw, Poland.
  • Guziewicz M; Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Ul. Koszykowa 75, 00-662 Warsaw, Poland.
Materials (Basel) ; 16(12)2023 Jun 14.
Article in En | MEDLINE | ID: mdl-37374564
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Full text: 1 Database: MEDLINE Language: En Journal: Materials (Basel) Year: 2023 Type: Article Affiliation country: Poland
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Full text: 1 Database: MEDLINE Language: En Journal: Materials (Basel) Year: 2023 Type: Article Affiliation country: Poland