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Colossal Optical Anisotropy from Atomic-Scale Modulations.
Mei, Hongyan; Ren, Guodong; Zhao, Boyang; Salman, Jad; Jung, Gwan Yeong; Chen, Huandong; Singh, Shantanu; Thind, Arashdeep S; Cavin, John; Hachtel, Jordan A; Chi, Miaofang; Niu, Shanyuan; Joe, Graham; Wan, Chenghao; Settineri, Nick; Teat, Simon J; Chakoumakos, Bryan C; Ravichandran, Jayakanth; Mishra, Rohan; Kats, Mikhail A.
Affiliation
  • Mei H; Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WI, 53706, USA.
  • Ren G; Institute of Materials Science and Engineering, Washington University in St. Louis, St. Louis, MO, 63130, USA.
  • Zhao B; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA.
  • Salman J; Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WI, 53706, USA.
  • Jung GY; Department of Mechanical Engineering and Material Science, Washington University in St. Louis, St. Louis, MO, 63130, USA.
  • Chen H; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA.
  • Singh S; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA.
  • Thind AS; Institute of Materials Science and Engineering, Washington University in St. Louis, St. Louis, MO, 63130, USA.
  • Cavin J; Department of Physics, Washington University in St. Louis, St. Louis, MO, 63130, USA.
  • Hachtel JA; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA.
  • Chi M; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA.
  • Niu S; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA.
  • Joe G; Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WI, 53706, USA.
  • Wan C; Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WI, 53706, USA.
  • Settineri N; Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, 53706, USA.
  • Teat SJ; Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
  • Chakoumakos BC; Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
  • Ravichandran J; Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA.
  • Mishra R; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA.
  • Kats MA; Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, CA, 90089, USA.
Adv Mater ; 35(42): e2303588, 2023 Oct.
Article in En | MEDLINE | ID: mdl-37529860
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Full text: 1 Database: MEDLINE Language: En Journal: Adv Mater Journal subject: BIOFISICA / QUIMICA Year: 2023 Type: Article Affiliation country: United States
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Full text: 1 Database: MEDLINE Language: En Journal: Adv Mater Journal subject: BIOFISICA / QUIMICA Year: 2023 Type: Article Affiliation country: United States