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Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.
Makhotkin, Igor A; Sobierajski, Ryszard; Chalupský, Jaromir; Tiedtke, Kai; de Vries, Gosse; Störmer, Michael; Scholze, Frank; Siewert, Frank; van de Kruijs, Robbert W E; Milov, Igor; Louis, Eric; Jacyna, Iwanna; Jurek, Marek; Klinger, Dorota; Nittler, Laurent; Syryanyy, Yevgen; Juha, Libor; Hájková, Vera; Vozda, Vojtech; Burian, Tomás; Saksl, Karel; Faatz, Bart; Keitel, Barbara; Plönjes, Elke; Schreiber, Siegfried; Toleikis, Sven; Loch, Rolf; Hermann, Martin; Strobel, Sebastian; Nienhuys, Han Kwang; Gwalt, Grzegorz; Mey, Tobias; Enkisch, Hartmut.
Afiliación
  • Makhotkin IA; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, The Netherlands.
  • Sobierajski R; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Chalupský J; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Tiedtke K; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • de Vries G; ASML Netherlands BV, PO Box 324, Veldhoven, 5500 AH, The Netherlands.
  • Störmer M; Helmholtz-Zentrum Geesthacht, Max-Planck-Strasse 1, Geesthacht 21502, Germany.
  • Scholze F; Physikalisch-Technische Bundesanstalt, Abbestrasse 2-12, Berlin 10587, Germany.
  • Siewert F; Helmholtz Zentrum Berlin für Materialien und Energie, Albert-Einstein-Strasse 15, Berlin 12489, Germany.
  • van de Kruijs RWE; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, The Netherlands.
  • Milov I; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, The Netherlands.
  • Louis E; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, The Netherlands.
  • Jacyna I; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Jurek M; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Klinger D; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Nittler L; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Syryanyy Y; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Juha L; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Hájková V; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Vozda V; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Burian T; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Saksl K; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Faatz B; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Keitel B; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Plönjes E; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Schreiber S; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Toleikis S; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Loch R; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Hermann M; Carl Zeiss SMT GmbH, Rudolf-Eber-Strasse 2, Oberkochen 73447, Germany.
  • Strobel S; Carl Zeiss SMT GmbH, Rudolf-Eber-Strasse 2, Oberkochen 73447, Germany.
  • Nienhuys HK; ASML Netherlands BV, PO Box 324, Veldhoven, 5500 AH, The Netherlands.
  • Gwalt G; Helmholtz Zentrum Berlin für Materialien und Energie, Albert-Einstein-Strasse 15, Berlin 12489, Germany.
  • Mey T; Laser-Laboratorium Göttingen eV, Hans-Adolf-Krebs-Weg 1, Göttingen 37077, Germany.
  • Enkisch H; Carl Zeiss SMT GmbH, Rudolf-Eber-Strasse 2, Oberkochen 73447, Germany.
J Synchrotron Radiat ; 25(Pt 1): 77-84, 2018 Jan 01.
Article en En | MEDLINE | ID: mdl-29271755
ABSTRACT
The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.
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Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: J Synchrotron Radiat Asunto de la revista: RADIOLOGIA Año: 2018 Tipo del documento: Article País de afiliación: Países Bajos

Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: J Synchrotron Radiat Asunto de la revista: RADIOLOGIA Año: 2018 Tipo del documento: Article País de afiliación: Países Bajos