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Vemurafenib-related photosensitivity.
Eberlein, Bernadette; Biedermann, Tilo; Hein, Rüdiger; Posch, Christian.
Afiliación
  • Eberlein B; Department of Dermatology and Allergology, Biederstein, School of Medicine, Technical University, Munich, Germany.
  • Biedermann T; Department of Dermatology and Allergology, Biederstein, School of Medicine, Technical University, Munich, Germany.
  • Hein R; Department of Dermatology and Allergology, Biederstein, School of Medicine, Technical University, Munich, Germany.
  • Posch C; Department of Dermatology and Allergology, Biederstein, School of Medicine, Technical University, Munich, Germany.
J Dtsch Dermatol Ges ; 18(10): 1079-1083, 2020 Oct.
Article en En | MEDLINE | ID: mdl-32558291
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Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: J Dtsch Dermatol Ges Asunto de la revista: DERMATOLOGIA Año: 2020 Tipo del documento: Article País de afiliación: Alemania
Texto completo
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Imprimir
XML
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Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: J Dtsch Dermatol Ges Asunto de la revista: DERMATOLOGIA Año: 2020 Tipo del documento: Article País de afiliación: Alemania