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Engineering a Robust Flat Band in III-V Semiconductor Heterostructures.
Franchina Vergel, Nathali A; Post, L Christiaan; Sciacca, Davide; Berthe, Maxime; Vaurette, François; Lambert, Yannick; Yarekha, Dmitri; Troadec, David; Coinon, Christophe; Fleury, Guillaume; Patriarche, Gilles; Xu, Tao; Desplanque, Ludovic; Wallart, Xavier; Vanmaekelbergh, Daniel; Delerue, Christophe; Grandidier, Bruno.
Afiliación
  • Franchina Vergel NA; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Post LC; Debye Institute for Nanomaterials Science, Utrecht University, 3508 TA Utrecht, The Netherlands.
  • Sciacca D; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Berthe M; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Vaurette F; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Lambert Y; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Yarekha D; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Troadec D; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Coinon C; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Fleury G; Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France.
  • Patriarche G; CNRS, Centre de Nanosciences et de Nanotechnologies (C2N), University Paris-Saclay, 91120 Palaiseau, France.
  • Xu T; Sino-European School of Technology, Shanghai University, 200444 Shanghai, China.
  • Desplanque L; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Wallart X; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Vanmaekelbergh D; Debye Institute for Nanomaterials Science, Utrecht University, 3508 TA Utrecht, The Netherlands.
  • Delerue C; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Grandidier B; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
Nano Lett ; 21(1): 680-685, 2021 Jan 13.
Article en En | MEDLINE | ID: mdl-33337891
ABSTRACT
Electron states in semiconductor materials can be modified by quantum confinement. Adding to semiconductor heterostructures the concept of lateral geometry offers the possibility to further tailor the electronic band structure with the creation of unique flat bands. Using block copolymer lithography, we describe the design, fabrication, and characterization of multiorbital bands in a honeycomb In0.53Ga0.47As/InP heterostructure quantum well with a lattice constant of 21 nm. Thanks to an optimized surface quality, scanning tunnelling spectroscopy reveals the existence of a strong resonance localized between the lattice sites, signature of a p-orbital flat band. Together with theoretical computations, the impact of the nanopatterning imperfections on the band structure is examined. We show that the flat band is protected against the lateral and vertical disorder, making this industry-standard system particularly attractive for the study of exotic phases of matter.
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Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2021 Tipo del documento: Article País de afiliación: Francia

Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2021 Tipo del documento: Article País de afiliación: Francia