Coarse-Grained Modeling of EUV Patterning Process Reflecting Photochemical Reactions and Chain Conformations.

Kim, Tae-Yi; Kang, In-Hwa; Park, Juhae; Kim, Myungwoong; Oh, Hye-Keun; Hur, Su-Mi

Kim, Tae-Yi; Kang, In-Hwa; Park, Juhae; Kim, Myungwoong; Oh, Hye-Keun; Hur, Su-Mi.

Afiliación

Kim TY; Department of Polymer Engineering, Graduate School, Chonnam National University, Gwangju 61186, Republic of Korea.
Kang IH; Department of Applied Physics, Hanyang University, Ansan 15588, Republic of Korea.
Park J; Department of Polymer Engineering, Graduate School, Chonnam National University, Gwangju 61186, Republic of Korea.
Kim M; Pritzker School of Molecular Engineering, The University of Chicago, Chicago, IL 60637, USA.
Oh HK; Department of Chemistry and Chemical Engineering, Inha University, Incheon 22212, Republic of Korea.
Hur SM; Department of Applied Physics, Hanyang University, Ansan 15588, Republic of Korea.

Polymers (Basel) ; 15(9)2023 Apr 22.

Article en En | MEDLINE | ID: mdl-37177136

Palabras clave

EUV photoresist; chain conformations; coarse-grained model; line edge roughness; stochastic effects

Texto completo

Añadir a Mi BVS

Imprimir

XML

PubMed Links

Buscar en Google

Texto completo: 1 Bases de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Polymers (Basel) Año: 2023 Tipo del documento: Article