Joule-assisted silicidation for short-channel silicon nanowire devices.
ACS Nano
; 5(9): 7117-23, 2011 Sep 27.
Article
em En
| MEDLINE
| ID: mdl-21815658
ABSTRACT
We report on a technique enabling electrical control of the contact silicidation process in silicon nanowire devices. Undoped silicon nanowires were contacted by pairs of nickel electrodes, and each contact was selectively silicided by means of the Joule effect. By a real-time monitoring of the nanowire electrical resistance during the contact silicidation process we were able to fabricate nickel-silicide/silicon/nickel-silicide devices with controlled silicon channel length down to 8 nm.
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Bases de dados:
MEDLINE
Idioma:
En
Revista:
ACS Nano
Ano de publicação:
2011
Tipo de documento:
Article
País de afiliação:
França