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Standard CMOS Fabrication of a Sensitive Fully Depleted Electrolyte-Insulator-Semiconductor Field Effect Transistor for Biosensor Applications.
Shalev, Gil; Cohen, Ariel; Doron, Amihood; Machauf, Andrew; Horesh, Moran; Virobnik, Udi; Ullien, Daniela; Levy, Ilan.
Afiliação
  • Shalev G; Intel Research Israel, Intel Electronics, Jerusalem 91031, Israel; E-Mails: gil.shalev@intel.com (G.S.); ariel.cohen@intel.com (A.C.); amihood.doron@intel.com (A.D.); andrew.machauf@intel.com (A.M.); moran.horesh@intel.com (M.H.); udi.virobnik@intel.com (U.V.); daniela.ullien@intel.com (D.U).
Sensors (Basel) ; 9(6): 4366-79, 2009.
Article em En | MEDLINE | ID: mdl-22408530
Microfabricated semiconductor devices are becoming increasingly relevant for detection of biological and chemical components. The integration of active biological materials together with sensitive transducers offers the possibility of generating highly sensitive, specific, selective and reliable biosensors. This paper presents the fabrication of a sensitive, fully depleted (FD), electrolyte-insulator-semiconductor field-effect transistor (EISFET) made with a silicon-on-insulator (SOI) wafer of a thin 10-30 nm active SOI layer. Initial results are presented for device operation in solutions and for bio-sensing. Here we report the first step towards a high volume manufacturing of a CMOS-based biosensor that will enable various types of applications including medical and environmental sensing.
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Texto completo: 1 Bases de dados: MEDLINE Tipo de estudo: Diagnostic_studies Idioma: En Revista: Sensors (Basel) Ano de publicação: 2009 Tipo de documento: Article

Texto completo: 1 Bases de dados: MEDLINE Tipo de estudo: Diagnostic_studies Idioma: En Revista: Sensors (Basel) Ano de publicação: 2009 Tipo de documento: Article