Demonstration of the high collection efficiency of a broadband Mo/Si multilayer mirror with a graded multilayer coating on an ellipsoidal substrate.

Ichimaru, S; Takenaka, H; Namikawa, K; Gullikson, E M; Maruyama, M; Oku, S

Ichimaru, S; Takenaka, H; Namikawa, K; Gullikson, E M; Maruyama, M; Oku, S.

Afiliação

Ichimaru S; NTT Advanced Technology Corporation, 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0124, Japan.
Takenaka H; NTT Advanced Technology Corporation, 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0124, Japan.
Namikawa K; Tokyo Gakugei University, Koganei, Tokyo 184-8501, Japan.
Gullikson EM; Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA.
Maruyama M; Quantum Beam Science Center, Japan Atomic Energy Agency, 8-1-7, Umemidai, Kizugawa, Kyoto 619-0215, Japan.
Oku S; NTT Advanced Technology Corporation, 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0124, Japan.

Rev Sci Instrum ; 86(9): 093106, 2015 Sep.

Article em En | MEDLINE | ID: mdl-26429428

ABSTRACT

ABSTRACT

A graded and broadband Mo/Si multilayer mirror for EUV spectroscopy is demonstrated. This mirror has an average reflectivity profile of 16% in the wavelength region from 15 nm to 17 nm and an effective area of 1100-1500 mm(2). This reflectivity is about 4 times larger than that of a standard Mo/Si multilayer mirror on a 1 in. diameter substrate, showing that the mirror can be used for measuring EUV fluorescence at wavelengths in the region around 15 nm to 17 nm.

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Texto completo: 1 Bases de dados: MEDLINE Idioma: En Revista: Rev Sci Instrum Ano de publicação: 2015 Tipo de documento: Article País de afiliação: Japão