Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers.
J Synchrotron Radiat
; 25(Pt 3): 785-792, 2018 May 01.
Article
em En
| MEDLINE
| ID: mdl-29714189
ABSTRACT
The interior structure, morphology and ligand surrounding of a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers are determined by various hard X-ray techniques in order to reveal the growth characteristics of Cr-based thin films. A Cr monolayer presents a three-stage growth mode with sudden changes occurring at a layer thickness of â¼2â
nm and beyond 6â
nm. Cr-based multilayers are proven to have denser structures due to interfacial diffusion and layer growth mode. Cr/C and Cr/Sc multilayers have different interfacial widths resulting from asymmetry, degree of crystallinity and thermal stability. Cr/Sc multilayers present similar ligand surroundings to Cr foil, whereas Cr/C multilayers are similar to Cr monolayers. The aim of this study is to help understand the structural evolution regulation versus layer thickness and to improve the deposition technology of Cr-based thin films, in particular for obtaining stable Cr-based multilayers with ultra-short periods.
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Bases de dados:
MEDLINE
Idioma:
En
Revista:
J Synchrotron Radiat
Assunto da revista:
RADIOLOGIA
Ano de publicação:
2018
Tipo de documento:
Article