High-throughput ab initio calculations on dielectric constant and band gap of non-oxide dielectrics.

Lee, Miso; Youn, Yong; Yim, Kanghoon; Han, Seungwu.

Afiliação

Lee M; Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University, Seoul, 08826, Korea.
Youn Y; Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University, Seoul, 08826, Korea.
Yim K; Korea Institute of Energy Research, Daejeon, 34129, Korea. khyim@kier.re.kr.
Han S; Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University, Seoul, 08826, Korea. hansw@snu.ac.kr.

Sci Rep ; 8(1): 14794, 2018 Oct 04.

Article em En | MEDLINE | ID: mdl-30287929

Texto completo: 1 Bases de dados: MEDLINE Idioma: En Revista: Sci Rep Ano de publicação: 2018 Tipo de documento: Article

Texto completo: 1 Bases de dados: MEDLINE Idioma: En Revista: Sci Rep Ano de publicação: 2018 Tipo de documento: Article