Using a Natural Ratio to Compare DC and AC Resistances.

Yu, Kwang Min; Jarrett, Dean G; Koffman, Andrew D; Rigosi, Albert F; Payagala, Shamith U; Ryu, Kwon Sang; Kang, Jeon Hong; Lee, Sang Hwa

Yu, Kwang Min; Jarrett, Dean G; Koffman, Andrew D; Rigosi, Albert F; Payagala, Shamith U; Ryu, Kwon Sang; Kang, Jeon Hong; Lee, Sang Hwa.

Afiliação

Yu KM; Korea Research Institute of Standards and Science, Yusong, Daejon, 305-600, Korea.
Jarrett DG; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
Koffman AD; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
Rigosi AF; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
Payagala SU; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
Ryu KS; Korea Research Institute of Standards and Science, Yusong, Daejon, 305-600, Korea.
Kang JH; Korea Research Institute of Standards and Science, Yusong, Daejon, 305-600, Korea.
Lee SH; Korea Research Institute of Standards and Science, Yusong, Daejon, 305-600, Korea.

IEEE Trans Instrum Meas ; 692019.

Article em En | MEDLINE | ID: mdl-33132410

Palavras-chave

DC and AC resistance; Thompson-Lampard theorem; silicon wafer; van der Pauw method

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Texto completo: 1 Bases de dados: MEDLINE Idioma: En Revista: IEEE Trans Instrum Meas Ano de publicação: 2019 Tipo de documento: Article