Silicon Oxide Etching Process of NF<sub>3</sub> and F<sub>3</sub>NO Plasmas with a Residual Gas Analyzer.

Kim, Woo-Jae; Bang, In-Young; Kim, Ji-Hwan; Park, Yeon-Soo; Kwon, Hee-Tae; Shin, Gi-Won; Kang, Min-Ho; Cho, Youngjun; Kwon, Byung-Hyang; Kwak, Jung-Hun; Kwon, Gi-Chung

Silicon Oxide Etching Process of NF₃ and F₃NO Plasmas with a Residual Gas Analyzer.

Kim, Woo-Jae; Bang, In-Young; Kim, Ji-Hwan; Park, Yeon-Soo; Kwon, Hee-Tae; Shin, Gi-Won; Kang, Min-Ho; Cho, Youngjun; Kwon, Byung-Hyang; Kwak, Jung-Hun; Kwon, Gi-Chung.

Afiliação

Kim WJ; Department of Electrical and Biological Physics, Kwangwoon University, 20 Kwangwoon-ro, Nowon-gu, Seoul 01897, Korea.
Bang IY; Department of Electrical and Biological Physics, Kwangwoon University, 20 Kwangwoon-ro, Nowon-gu, Seoul 01897, Korea.
Kim JH; Department of Electrical and Biological Physics, Kwangwoon University, 20 Kwangwoon-ro, Nowon-gu, Seoul 01897, Korea.
Park YS; Department of Electrical and Biological Physics, Kwangwoon University, 20 Kwangwoon-ro, Nowon-gu, Seoul 01897, Korea.
Kwon HT; Department of Electrical and Biological Physics, Kwangwoon University, 20 Kwangwoon-ro, Nowon-gu, Seoul 01897, Korea.
Shin GW; Department of Electrical and Biological Physics, Kwangwoon University, 20 Kwangwoon-ro, Nowon-gu, Seoul 01897, Korea.
Kang MH; Department of Nano-Process, National Nanofab Center (NNFC), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea.
Cho Y; SK Materials Co., Ltd., 110-5, Myeonghaksandan-ro, Yeondong-myeon, Sejong 30068, Korea.
Kwon BH; SK Materials Co., Ltd., 110-5, Myeonghaksandan-ro, Yeondong-myeon, Sejong 30068, Korea.
Kwak JH; SK Materials Co., Ltd., 110-5, Myeonghaksandan-ro, Yeondong-myeon, Sejong 30068, Korea.
Kwon GC; Department of Electrical and Biological Physics, Kwangwoon University, 20 Kwangwoon-ro, Nowon-gu, Seoul 01897, Korea.

Materials (Basel) ; 14(11)2021 Jun 02.

Article em En | MEDLINE | ID: mdl-34199585

Palavras-chave

nitrogen fluoride oxide; nitrogen oxide trifluoride; reactive ion etch; silicon oxide etch

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Texto completo: 1 Bases de dados: MEDLINE Idioma: En Revista: Materials (Basel) Ano de publicação: 2021 Tipo de documento: Article