X-ray Metrology for the Semiconductor Industry Tutorial.

Sunday, Daniel F; Wu, Wen-Li; Barton, Scott; Kline, R Joseph

Sunday, Daniel F; Wu, Wen-Li; Barton, Scott; Kline, R Joseph.

Afiliação

Sunday DF; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
Wu WL; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
Barton S; SAXS Lab US, Inc, 7 Pomeroy Ln., Unit 3, Amherst, MA 01002, USA.
Kline RJ; National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.

J Res Natl Inst Stand Technol ; 124: 1-3, 2019.

Article em En | MEDLINE | ID: mdl-34877161

Palavras-chave

CDSAXS; dimensional metrology; semiconductor industry; small angle x-ray scattering

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Texto completo: 1 Bases de dados: MEDLINE Idioma: En Revista: J Res Natl Inst Stand Technol Ano de publicação: 2019 Tipo de documento: Article País de afiliação: Estados Unidos

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