Evolutionary Optimization of Directed Self-Assembly of Triblock Copolymers on Chemically Patterned Substrates.

Khaira, Gurdaman S; Qin, Jian; Garner, Grant P; Xiong, Shisheng; Wan, Lei; Ruiz, Ricardo; Jaeger, Heinrich M; Nealey, Paul F; de Pablo, Juan J

Khaira, Gurdaman S; Qin, Jian; Garner, Grant P; Xiong, Shisheng; Wan, Lei; Ruiz, Ricardo; Jaeger, Heinrich M; Nealey, Paul F; de Pablo, Juan J.

Afiliação

Khaira GS; Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.
Qin J; Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.
Garner GP; Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.
Xiong S; Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.
Wan L; HGST, A Western Digital Company, San Jose, California 95135, United States.
Ruiz R; HGST, A Western Digital Company, San Jose, California 95135, United States.
Jaeger HM; James Franck Institute, The University of Chicago, Chicago, Illinois 60637, United States.
Nealey PF; Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.
de Pablo JJ; Argonne National Laboratory, Argonne, Illinois 60439, United States.

ACS Macro Lett ; 3(8): 747-752, 2014 Aug 19.

Article em En | MEDLINE | ID: mdl-35590693

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Texto completo: 1 Bases de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Revista: ACS Macro Lett Ano de publicação: 2014 Tipo de documento: Article País de afiliação: Estados Unidos

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