The effect of Coulomb repulsion on the space-time resolution limits for ultrafast electron diffraction.

The development of electron sources capable of temporal resolution on the order of 1 ps or less raises a number of questions associated with the estimation of the physical meaning and accuracy of the dynamic parameters based on the analysis of time-dependent scattering intensity. The use of low brightness ultrashort pulses with few electrons leads to the necessity for increasing the total exposure time and lengthening the time of data acquisition, with attendant problems with the limited sample. The sample restrictions can be mitigated by increasing the charge per pulse, i.e., by going to high brightness sources. Increasing in the number of electrons, however, is limited by the Coulomb repulsion between them, which leads on one hand to distortion of the diffraction pattern and on the other hand to an increase in the duration of the pulse. An analytical technique for estimating the deformation of the diffraction pattern caused by the Coulomb repulsion of the electrons in electron bunches with duration of less than 10 ps and the influence of this effect on the accuracy of determination of the interatomic distances is developed for the non-relativistic and relativistic regimes for electron energies.

Investigation of the error self-compensation effect associated with direct broad band monitoring of coating production.

Computational manufacturing experiments are used to detect the types of optical coatings that are showing the presence of a strong error self-compensation effect in the coating production with direct broad band monitoring. It is shown that predictions made on the basis of these experiments coincide with the predictions of the previously developed rigorous mathematical approach to the investigation of the error self-compensation effect.

Error self-compensation mechanism in the optical coating production with direct broad band monitoring.

The main theoretical results related to the investigation of the error self-compensation mechanism associated with direct broad band monitoring of optical coating production are presented. The presented results are illustrated using the production of Brewster angle polarizer where this effect is especially strong. Specific properties of the design merit function required for the presence of the error self-compensation effect are discussed and the mechanism of thickness errors correlation by the direct broad band monitoring is described. It is also discussed how one can check whether a strong error self-compensation effect may be expected for a given coating design and specific parameters of the monitoring procedure that will be used for coating production.