RESUMO
We present a metal-dielectric stack ultraviolet (UV) bandpass filter that rejects the longer wavelength, visible spectrum and is thin and relatively insensitive to the angle of incidence. Parametric evaluations of the reflection phase shift at the metal-dielectric interface provide insight and design information. This nontrivial phase shift allows coupled Fabry-Perot resonances with subwavelength dielectric film thickness. Furthermore, the total phase shift, with contributions from wave propagation and nontrivial reflection phase shift, is insensitive to the angle of incidence. Filter passbands in the UV can be shifted to visible or longer wavelengths by engineering the dielectric thickness and selecting a metal with an appropriate plasma frequency.
RESUMO
Due to the small skin depth in metals at optical frequencies, their plasmonic response is strongly dictated by their surface properties. Copper (Cu) is one of the standard materials of choice for plasmonic applications, because of its high conductivity and CMOS compatibility. However, being a chemically active material, it gets easily oxidized when left in ambient environment, causing an inevitable degradation in its plasmonic resonance. Here, for the first time, we report a strong enhancement in the optical relaxation time in Cu by direct growth of few-layer graphene that is shown to act as an excellent passivation layer protecting Cu surface from any deterioration. Spectroscopic ellipsometry measurements reveal a 40-50% reduction in the total scattering rate in Cu itself, which is attributed to an improvement in its surface properties. We also study the impact of graphene quality and show that high quality graphene leads to an even larger improvement in electron scattering rate. These findings are expected to provide a big push towards graphene-protected Cu plasmonics.