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Kapitza Resistance between Few-Layer Graphene and Water: Liquid Layering Effects.
Alexeev, Dmitry; Chen, Jie; Walther, Jens H; Giapis, Konstantinos P; Angelikopoulos, Panagiotis; Koumoutsakos, Petros.
Afiliação
  • Alexeev D; Computational Science and Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich , CH-8092 Zurich, Switzerland.
  • Chen J; Computational Science and Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich , CH-8092 Zurich, Switzerland.
  • Walther JH; Computational Science and Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich , CH-8092 Zurich, Switzerland.
  • Giapis KP; Department of Mechanical Engineering, Technical University of Denmark , DK-2800 Kgs. Lyngby, Denmark.
  • Angelikopoulos P; Division of Chemistry and Chemical Engineering, California Institute of Technology , Pasadena, California 91125, United States.
  • Koumoutsakos P; Computational Science and Engineering Laboratory, Department of Mechanical and Process Engineering, ETH Zurich , CH-8092 Zurich, Switzerland.
Nano Lett ; 15(9): 5744-9, 2015 Sep 09.
Article em En | MEDLINE | ID: mdl-26274389

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2015 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2015 Tipo de documento: Article