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High Reflectance Nanoscale V/Sc Multilayer for Soft X-ray Water Window Region.
Huang, Qiushi; Yi, Qiang; Cao, Zhaodong; Qi, Runze; Loch, Rolf A; Jonnard, Philippe; Wu, Meiyi; Giglia, Angelo; Li, Wenbin; Louis, Eric; Bijkerk, Fred; Zhang, Zhong; Wang, Zhanshan.
Afiliação
  • Huang Q; Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China.
  • Yi Q; Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang, 621900, China.
  • Cao Z; Shanghai Institute of Laser Plasma, China Academy of Engineering Physics, Shanghai, China.
  • Qi R; Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China.
  • Loch RA; The Max Planck Institute for the Structure and Dynamics of Matter, Center for Free Electron Laser Science, LuruperChaussee 149, Hamburg, 22761, Germany.
  • Jonnard P; Sorbonne Universités, UPMC Univ Paris 06, Laboratoire de Chimie Physique-Matière et Rayonnement, 11 Rue Pierre et Marie Curie, F-75231, Paris Cedex 05, Paris, France.
  • Wu M; CNRS UMR 7614, Laboratoire de Chimie Physique-Matière et Rayonnement, 11 Rue Pierre et Marie Curie, F-75231, Paris Cedex 05, Paris, France.
  • Giglia A; Sorbonne Universités, UPMC Univ Paris 06, Laboratoire de Chimie Physique-Matière et Rayonnement, 11 Rue Pierre et Marie Curie, F-75231, Paris Cedex 05, Paris, France.
  • Li W; CNRS UMR 7614, Laboratoire de Chimie Physique-Matière et Rayonnement, 11 Rue Pierre et Marie Curie, F-75231, Paris Cedex 05, Paris, France.
  • Louis E; CNR Istituto Officina Materiali, 34149, Trieste, Italy.
  • Bijkerk F; Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China.
  • Zhang Z; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE, Enschede, The Netherlands.
  • Wang Z; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE, Enschede, The Netherlands.
Sci Rep ; 7(1): 12929, 2017 10 10.
Article em En | MEDLINE | ID: mdl-29018232
ABSTRACT
V/Sc multilayer is experimentally demonstrated for the first time as a high reflectance mirror for the soft X-ray water window region. It primarily works at above the Sc-L edge (λ = 3.11 nm) under near normal incidence while a second peak appears at above the V-L edge (λ = 2.42 nm) under grazing incidence. The V/Sc multilayer fabricated with a d-spacing of 1.59 nm and 30 bilayers has a smaller interface width (σ = 0.27 and 0.32 nm) than the conventional used Cr/Sc (σ = 0.28 and 0.47 nm). For V/Sc multilayer with 30 bilayers, the introduction of B4C barrier layers has little improvement on the interface structure. As the number of bilayers increasing to 400, the growth morphology and microstructure of the V/Sc layers evolves with slightly increased crystallization. Nevertheless, the surface roughness remains to be 0.25 nm. A maximum soft X-ray reflectance of 18.4% is measured at λ = 3.129 nm at 9° off-normal incidence using the 400-bilayers V/Sc multilayer. According to the fitted model, an s-polarization reflectance of 5.2% can also be expected at λ = 2.425 nm under 40° incidence. Based on the promising experimental results, further improvement of the reflectance can be achieved by using a more stable deposition system, exploring different interface engineering methods and so on.

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2017 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2017 Tipo de documento: Article