Nanoscale charge transfer and diffusion at the MoS<sub>2</sub>/SiO<sub>2</sub> interface by atomic force microscopy: contact injection versus triboelectrification.

Nanoscale charge transfer and diffusion at the MoS₂/SiO₂ interface by atomic force microscopy: contact injection versus triboelectrification.

Xu, Rui; Ye, Shili; Xu, Kunqi; Lei, Le; Hussain, Sabir; Zheng, Zhiyue; Pang, Fei; Xing, Shuya; Liu, Xinmeng; Ji, Wei; Cheng, Zhihai.

Afiliação

Xu R; CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China. Department of Physics and Beijing Key Laboratory of Optoelectronic Functional Materials & Micro-nano Devices, Renmin University of China, Beijing 100872, People's Republic of China.

Nanotechnology ; 29(35): 355701, 2018 Aug 31.

Article em En | MEDLINE | ID: mdl-29873636

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2018 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2018 Tipo de documento: Article