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Robust DNA-Bridged Memristor for Textile Chips.
Xu, Xiaojie; Zhou, Xufeng; Wang, Tianyu; Shi, Xiang; Liu, Ya; Zuo, Yong; Xu, Limin; Wang, Mengying; Hu, Xiaofeng; Yang, Xinju; Chen, Jiaxin; Yang, Xiubo; Chen, Lin; Chen, Peining; Peng, Huisheng.
Afiliação
  • Xu X; State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China.
  • Zhou X; State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China.
  • Wang T; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China.
  • Shi X; State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China.
  • Liu Y; International Research Center for Renewable Energy, State Key Laboratory of Multiphase Flow in Power Engineering, Xi'an Jiao Tong University, Shannxi, 710049, China.
  • Zuo Y; State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China.
  • Xu L; State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China.
  • Wang M; State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China.
  • Hu X; State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, China.
  • Yang X; State Key Laboratory of Surface Physics, Fudan University, Shanghai, 200438, China.
  • Chen J; Department of Materials Science, Fudan University, Shanghai, 200438, China.
  • Yang X; Analytical & Testing Center, Northwestern Polytechnical University, Shaanxi, 710072, China.
  • Chen L; State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China.
  • Chen P; State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China.
  • Peng H; State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China.
Angew Chem Int Ed Engl ; 59(31): 12762-12768, 2020 07 27.
Article em En | MEDLINE | ID: mdl-32342610
ABSTRACT
Electronic textiles may revolutionize many fields, such as communication, health care and artificial intelligence. To date, unfortunately, computing with them is not yet possible. Memristors are compatible with the interwoven structure and manufacturing process in textiles because of its two-terminal crossbar configuration. However, it remains a challenge to realize textile memristors owing to the difficulties in designing advanced memristive materials and achieving high-quality active layers on fiber electrodes. Herein we report a robust textile memristor based on an electrophoretic-deposited active layer of deoxyribonucleic acid (DNA) on fiber electrodes. The unique architecture and orientation of DNA molecules with the incorporation of Ag nanoparticles offer the best-in-class performances, e.g., both ultra-low operation voltage of 0.3 V and power consumption of 100 pW and high switching speed of 20 ns. Fundamental logic calculations such as implication and NAND are demonstrated as functions of textile chips, and it has been thus integrated with power-supplying and light emitting modules to demonstrate an all-fabric information processing system.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article