Extreme-Ultraviolet Shaping and Imaging by High-Harmonic Generation from Nanostructured Silica.

Roscam Abbing, Sylvianne D C; Kolkowski, Radoslaw; Zhang, Zhuang-Yan; Campi, Filippo; Lötgering, Lars; Koenderink, A Femius; Kraus, Peter M.

Afiliação

Roscam Abbing SDC; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands.
Kolkowski R; Center for Nanophotonics, AMOLF, Science Park 104, 1098XG Amsterdam, Netherlands.
Zhang ZY; Optics and Photonics Group, Department of Applied Physics, Aalto University, P.O. Box 13500, FI-00076 Aalto, Finland.
Campi F; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands.
Lötgering L; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands.
Koenderink AF; Advanced Research Center for Nanolithography (ARCNL), Science Park 106, 1098XG Amsterdam, Netherlands.
Kraus PM; Center for Nanophotonics, AMOLF, Science Park 104, 1098XG Amsterdam, Netherlands.

Phys Rev Lett ; 128(22): 223902, 2022 Jun 03.

Article em En | MEDLINE | ID: mdl-35714263

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article