Atomistic Simulation of the Ion-Assisted Deposition of Silicon Dioxide Thin Films.

Grigoriev, F V; Sulimov, V B; Tikhonravov, A V.

Afiliação

Grigoriev FV; Research Computing Center, M.V. Lomonosov Moscow State University, Leninskie Gory, 119234 Moscow, Russia.
Sulimov VB; Moscow Center for Fundamental and Applied Mathematics, M.V. Lomonosov Moscow State University, Leninskie Gory, 119234 Moscow, Russia.
Tikhonravov AV; Research Computing Center, M.V. Lomonosov Moscow State University, Leninskie Gory, 119234 Moscow, Russia.

Nanomaterials (Basel) ; 12(18)2022 Sep 19.

Article em En | MEDLINE | ID: mdl-36145030