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1.
Dent Mater ; 23(8): 1011-7, 2007 Aug.
Artículo en Inglés | MEDLINE | ID: mdl-17097138

RESUMEN

OBJECTIVE: To evaluate properties of silorane-based resins and composites containing a stress reducing monomer. METHODS: Resin mixtures and composites were formulated containing (a) a developmental stress reducing monomer [TOSU; Midwest Research Institute]; (b) Sil-Mix (3M-ESPE); (c) photo cationic initiator system. Standard BISGMA/TEGDMA resin (B/T) and composite (Filtek Z250) were used as controls. Polymerization volume change was measured using a NIST mercury dilatometer and polymerization stress using an Enduratec mechanical testing machine. Three point bend tests determined flexural elastic modulus, work of fracture, and ultimate strength (ADA 27; ISO 4049). Fracture toughness was measured using ASTM E399-90. Four groups of resins and composites were tested: Sil-Mix, methacrylate standard, and Sil-Mix with two addition levels of TOSU. An ANOVA was used and significant differences ranked using Student-Newman-Keuls test (alpha=0.05). RESULTS: Polymerization stress values for resins containing TOSU were significantly less than the other materials. Polymerization shrinkage values for Sil-Mix formulations were significantly less than for B/T, but were not different from each other. TOSU-containing formulations generally had somewhat lower mechanical properties values than Sil-Mix or B/T. Polymerization stress values for Sil-Mix-based composites were significantly less as compared to Z250. The 1wt.% TOSU composite had the lowest stress. No difference between composite groups was noted for fracture toughness or work of fracture. For ultimate strength, the 5wt.% TOSU formulation differed significantly from Z250. All Sil-Mix formulations had elastic modulus values significantly different from Z250. SIGNIFICANCE: The ability of TOSU to reduce polymerization stress without a proportional reduction in mechanical properties provides a basis for improvement of silorane-based composites.


Asunto(s)
Resinas Compuestas/química , Compuestos de Silicona/química , Compuestos de Espiro/química , Compuestos de Trimetilsililo , Alcanos/química , Análisis de Varianza , Resinas Compuestas/síntesis química , Resinas Compuestas/efectos de la radiación , Adaptación Marginal Dental , Análisis del Estrés Dental , Elasticidad , Compuestos Epoxi/química , Dureza , Luz , Ensayo de Materiales , Transición de Fase , Docilidad
2.
Dent Mater ; 21(7): 591-8, 2005 Jul.
Artículo en Inglés | MEDLINE | ID: mdl-15978267

RESUMEN

OBJECTIVES: The goal of this study is to develop a model used to predict octanol/water partition coefficients (log P(o/w)) values for a variety of potential dental materials. In this way, a primary consideration for potential toxicity and a rough estimate of solubility in various environments can be obtained. METHOD: The AM1 semiempirical quantum mechanical method (in AMPAC) was used to compute chemical data for all compounds in the study. CODESSA then imported the chemical information from AMPAC and computed a large set of informational descriptors. A quantitative structure activity relationship (QSAR) model was derived correlating experimental results from a training set of molecules with certain of the descriptors computed above. RESULTS: A training set of 92 molecules was used to derive the QSAR model and three descriptors were obtained: the molecular surface area, the total dipole moment of the molecule, and FPSA-3 (fractional atom charge weighted partial positive surface area). Various quality indicators were also computed and all fell within acceptable ranges: R(2)=0.945; adjusted R(2)=0.943; R(cv)(2)=0.940; variance inflation factors (VIF) for the descriptors above are 1.116, 1.044, and 1.162, respectively. SIGNIFICANCE: This QSAR model can be used to accurately and rapidly predict log P(o/w) values for a wide variety of small organic molecules, including potential dental monomers.


Asunto(s)
Materiales Dentales/química , Lípidos/química , Octanoles/química , Bases de Datos Factuales , Materiales Dentales/toxicidad , Ensayo de Materiales , Modelos Químicos , Estructura Molecular , Relación Estructura-Actividad Cuantitativa , Teoría Cuántica , Solubilidad
3.
Dent Mater ; 21(4): 384-90, 2005 Apr.
Artículo en Inglés | MEDLINE | ID: mdl-15766586

RESUMEN

OBJECTIVES: The objectives were to investigate the structure and selected physical properties of products resulting from the photopolymerization of a binary mixture containing an aliphatic dioxirane, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate (ECHM-ECHC) and a potential expanding monomer, 3,9-bis(oxiranylcyclohexylmethyl)-1,5,7,11-tetraoxaspiro[5.5]undecane (BOCHM-TOSU). METHODS: Reaction mixtures were irradiated with a dental curing lamp at room temperature. Some reactions were quenched prior to gel point. Oligomeric products were separated from unreacted monomers by column chromatography, and analyzed by NMR. Physical properties of polymeric solids were measured using accepted standard methods. Protonation energies for monomers were calculated using semi-empirical quantum mechanical methods. RESULTS: Types of oligomers found included poly(ether)s and poly(carbonate)s. Quantum mechanical calculations indicated preferential attack at the more nucleophilic oxaspirocyclic ring sites. For cured solid polymer samples, the elastic modulus was 2.39 +/- 0.24 GPa and the fracture toughness was 0.73 +/- 0.10 MPa m(1/2). These values were similar to those measured for a cured conventional BISGMA/TEGDMA matrix resin. SIGNIFICANCE: The room-temperature photopolymerization of an aliphatic dioxirane and a potential expanding monomer demonstrates the possibility of making cross-linked copolymer resins with improved polymerization shrinkage characteristics for use in dental composites.


Asunto(s)
Materiales Dentales/química , Resinas Epoxi/química , Luz , Polímeros/química , Alcanos/química , Alcanos/efectos de la radiación , Bisfenol A Glicidil Metacrilato/química , Cationes , Resinas Compuestas/química , Ciclohexanos/química , Ciclohexanos/efectos de la radiación , Materiales Dentales/efectos de la radiación , Elasticidad , Compuestos Epoxi/química , Compuestos Epoxi/efectos de la radiación , Resinas Epoxi/efectos de la radiación , Éteres/química , Éteres/efectos de la radiación , Humanos , Ensayo de Materiales , Cemento de Policarboxilato/química , Cemento de Policarboxilato/efectos de la radiación , Polietilenglicoles/química , Polímeros/efectos de la radiación , Ácidos Polimetacrílicos/química , Compuestos de Espiro/química , Compuestos de Espiro/efectos de la radiación , Propiedades de Superficie
4.
J Biomed Mater Res A ; 65(1): 89-94, 2003 Apr 01.
Artículo en Inglés | MEDLINE | ID: mdl-12635158

RESUMEN

The objective of this study was to measure IL-6 release from LPS-stimulated and -unstimulated macrophages exposed to extracts from fresh and aged Scotchbond Multipurpose Plus adhesive disks (5 mm in diameter by 2 mm in thickness) light cured for 10, 20, or 40 s. One set of disks was aged for 16 weeks at 4 degrees C. Extracts were prepared by incubating three disks in 1 mL of serum-free culture medium for 72 h at 37 degrees C. Then macrophages (RAW 264.7) were exposed to the extracts (6.25-50 microL) for 72 h at 37 degrees C/5% CO(2). Supernatants were analyzed for cytokine levels (ELISA), and the monolayer of cells was assessed for viability (MTT assay). Unlike adhesive disk age, curing time affected cell viability. Disk extracts cured for 10 s were more cytotoxic (p < 0.05) than were extracts from 20- or 40-s cured disks. Macrophage release of IL-6 was stimulated significantly (p < 0.01) by extracts from fresh 10-s cured disks, up to 777 pg/mL and by 2 microg/mL of LPS (1174 pg/mL). The LPS response was significantly (p < 0.05) suppressed by 50 microL of extracts, which may be related to the enhanced cytotoxicity exhibited by LPS in combination with extracts. This study has demonstrated the possibility that IL-6 release is stimulated by light-cure dental adhesive applications using 10-s curings.


Asunto(s)
Adhesivos , Materiales Dentales , Interleucina-6/metabolismo , Lipopolisacáridos/farmacología , Macrófagos/metabolismo , Adhesivos/efectos de la radiación , Animales , Línea Celular , Supervivencia Celular/efectos de los fármacos , Supervivencia Celular/efectos de la radiación , Citocinas/biosíntesis , Citocinas/metabolismo , Materiales Dentales/efectos de la radiación , Ensayo de Inmunoadsorción Enzimática , Luz , Macrófagos/efectos de los fármacos , Macrófagos/efectos de la radiación , Ratones , Estimulación Química , Sales de Tetrazolio , Tiazoles
5.
Mutat Res ; 563(1): 25-34, 2004 Sep 12.
Artículo en Inglés | MEDLINE | ID: mdl-15324746

RESUMEN

Cyracure UVR 6105 is a cycloaliphatic epoxy monomer and has both carboxylate and epoxy groups, with the potential for rapid polymerization. It is widely used in industry for the preparation of inks, resins, coatings, and was proposed for incorporation into dental composites. The objective of this study was to determine the mutagenic potential of this chemical related to its metabolite products. Several doses of Cyracure UVR 6105 were dissolved in DMSO and subjected to the Ames Salmonella mutagenicity assay. A metabolic activation system (S9-mix) was used consisting of Arochlor-induced liver S9 homogenate enriched with NADP and glucose-6-phosphate cofactors. In contrast to studies without S9-mix, Cyracure UVR 6105 exhibited enhanced genotoxic activities with strains TA100 and TA1535 in the presence of liver S9-mix. From in vitro metabolism of Cyracure UVR 6105 with S9-mix, as used in the Ames assay, several metabolites were identified. The alcohol metabolite, 3,4-epoxycyclohexylmethanol, containing intact epoxy group was identified in the organic solvent extract. This metabolite was synthesized and proved to be mutagenic against TA100 when assayed in the presence and absence of S9-mix. Results showed that the increased mutagenicity of Cyracure UVR-6105 in the presence of liver enzymes is due to the formation of the mutagenic metabolite 3,4-epoxycyclohexylmethanol.


Asunto(s)
Resinas Epoxi/metabolismo , Resinas Epoxi/toxicidad , Mutágenos/metabolismo , Mutágenos/toxicidad , Animales , Resinas Epoxi/química , Técnicas In Vitro , Extractos Hepáticos/química , Extractos Hepáticos/metabolismo , Espectroscopía de Resonancia Magnética , Metanol/análogos & derivados , Microsomas Hepáticos/química , Microsomas Hepáticos/metabolismo , Estructura Molecular , Pruebas de Mutagenicidad , Ratas , Salmonella typhimurium/efectos de los fármacos , Salmonella typhimurium/metabolismo , Porcinos
6.
J Chem Inf Model ; 45(4): 924-9, 2005.
Artículo en Inglés | MEDLINE | ID: mdl-16045286

RESUMEN

Allergic contact dermatitis (ACD) results in inflammation of the skin due to sensitization of the immunologic system to a particular substance. The sensitization process is limited by the compound's ability to both permeate and react with proteins in the integumentary system. Currently, only in vivo animal tests such as the local lymph node assay (LLNA) are recognized by regulatory authorities for risk assessment of ACD. A quantitative structure-activity relationship has been developed to predict relative potency, which allows for the prediction of relative sensitization potentials. The experimental values used in this study include EC3 values (the concentration at which the stimulation index equals 3) from LLNA tests. The predictions in this model enable categorization of the compounds into three groups on the basis of risk of sensitization and enable screening of candidate molecules using rapid SAM1 semiempirical calculations prior to animal testing. The model may also be used to reduce the number of animals subjected to testing by providing estimated concentrations required for useful data of risk assessment. The effect of averaging available literature values on predictive ability is also investigated. The model includes halogenated compounds, aromatic compounds, alcohols, aldehydes, and ketones. The computational investigation resulted in a two-descriptor model that is consistent with the assumed mechanism for sensitization.


Asunto(s)
Hipersensibilidad , Modelos Inmunológicos , Relación Estructura-Actividad Cuantitativa , Teoría Cuántica , Piel , Hipersensibilidad/inmunología , Medición de Riesgo , Piel/inmunología
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