Development of dual-beamline photoelectron momentum microscopy for valence orbital analysis.

The soft X-ray photoelectron momentum microscopy (PMM) experimental station at the UVSOR Synchrotron Facility has been recently upgraded by additionally guiding vacuum ultraviolet (VUV) light in a normal-incidence configuration. PMM offers a very powerful tool for comprehensive electronic structure analyses in real and momentum spaces. In this work, a VUV beam with variable polarization in the normal-incidence geometry was obtained at the same sample position as the soft X-ray beam from BL6U by branching the VUV beamline BL7U. The valence electronic structure of the Au(111) surface was measured using horizontal and vertical linearly polarized (s-polarized) light excitations from BL7U in addition to horizontal linearly polarized (p-polarized) light excitations from BL6U. Such highly symmetric photoemission geometry with normal incidence offers direct access to atomic orbital information via photon polarization-dependent transition-matrix-element analysis.

A new EXAFS method for the local structure analysis of low-Z elements.

A unique analytical method is proposed for local structure analysis via extended X-ray absorption fine structure (EXAFS) spectroscopy. The measurement of electron energy distribution curves at various excitation photon energies using an electron energy analyzer is applied to determine a specific elemental Auger spectrum. To demonstrate the method, the N K-edge EXAFS spectra for a silicon nitride film were obtained via simultaneous measurement of the N KLL Auger and background spectra using dual-energy windows. The background spectrum was then used to remove the photoelectrons and secondary electron mixing in the energy distribution curves. The spectrum obtained following this subtraction procedure represents the `true' N K-edge EXAFS spectrum without the other absorptions that are observed in total electron yield N K-edge EXAFS spectra. The first nearest-neighbor distance (N-Si) derived from the extracted N K-edge EXAFS oscillation was in good agreement with the value derived from Si K-edge analysis. This result confirmed that the present method, referred to as differential electron yield (DEY)-EXAFS, is valid for deriving local surface structure information for low-Z elements.

Design and performance of a new VIS-VUV photoluminescence beamline at UVSOR-III.

A new bending-magnet beamline with a 2.5 m normal-incidence monochromator has been constructed to serve with a light source in the visible-vacuum-ultraviolet region for photoluminescence, transmission and reflection spectroscopies of solids at the UVSOR-III 750 MeV synchrotron radiation light source. The aim is to pave the way to establishing a beamline with high photon flux, high brilliance, high energy-resolution, high linear-polarization and low higher-order light. To obtain high photon flux and brilliance, the acceptance angle of the bending-magnet radiation was designed to be 40 mrad (H) × 14 mrad (V) and the post-mirror system employed Kirkpatrick-Baez optics. The incidence angle of the incoming light to the optical elements, except to the gratings, was set to a grazing angle in order to keep a degree of linear polarization. For achieving high energy-resolution, an off-plane Eagle-type monochromator was adopted. Higher-order unwanted light in the energy range below ∼11 eV was suppressed to be less than 0.1%.

Soft x-ray photoelectron momentum microscope for multimodal valence band stereography.

The photoelectron momentum microscope (PMM) in operation at BL6U, an undulator-based soft x-ray beamline at the UVSOR Synchrotron Facility, offers a new approach for µm-scale momentum-resolved photoelectron spectroscopy (MRPES). A key feature of the PMM is that it can very effectively reduce radiation-induced damage by directly projecting a single photoelectron constant energy contour in reciprocal space with a radius of a few Å-1 or real space with a radius of a few 100 µm onto a two-dimensional detector. This approach was applied to three-dimensional valence band structure E(k) and E(r) measurements ("stereography") as functions of photon energy (hν), its polarization (e), detection position (r), and temperature (T). In this study, we described some examples of possible measurement techniques using a soft x-ray PMM. We successfully applied this stereography technique to µm-scale MRPES to selectively visualize the single-domain band structure of twinned face-centered-cubic Ir thin films grown on Al2O3(0001) substrates. The photon energy dependence of the photoelectron intensity on the Au(111) surface state was measured in detail within the bulk Fermi surface. By changing the temperature of 1T-TaS2, we clarified the variations in the valence band dispersion associated with chiral charge-density-wave phase transitions. Finally, PMMs for valence band stereography with various electron analyzers were compared, and the advantages of each were discussed.

SAMRAI: a novel variably polarized angle-resolved photoemission beamline in the VUV region at UVSOR-II.

A novel variably polarized angle-resolved photoemission spectroscopy beamline in the vacuum-ultraviolet (VUV) region has been installed at the UVSOR-II 750 MeV synchrotron light source. The beamline is equipped with a 3 m long APPLE-II type undulator with horizontally/vertically linear and right/left circular polarizations, a 10 m Wadsworth type monochromator covering a photon energy range of 6-43 eV, and a 200 mm radius hemispherical photoelectron analyzer with an electron lens of a +/-18 degrees acceptance angle. Due to the low emittance of the UVSOR-II storage ring, the light source is regarded as an entrance slit, and the undulator light is directly led to a grating by two plane mirrors in the monochromator while maintaining a balance between high-energy resolution and high photon flux. The energy resolving power (hnu/Deltahnu) and photon flux of the monochromator are typically 1 x 10(4) and 10(12) photons/s, respectively, with a 100 microm exit slit. The beamline is used for angle-resolved photoemission spectroscopy with an energy resolution of a few meV covering the UV-to-VUV energy range.