Ultralow Index SiO2 Antireflection Coatings Produced via Magnetron Sputtering.
Nano Lett
; 22(18): 7358-7362, 2022 Sep 28.
Article
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| MEDLINE
| ID: mdl-36094866
ABSTRACT
Antireflection (AR) coatings with graded refractive index profiles approaching air offer unparalleled AR performance but lack a scalable fabrication process that would enable them to be used more widely in applications such as architecture and solar energy conversion. This work introduces a sputtering-based sacrificial porogen process to fabricate multilayer nanoporous SiO2 coatings with tunable refractive index down to neff = 1.11. Using this approach, we demonstrate a step-graded bilayer AR coating with outstanding wide-angle AR performance (single side average reflectivity in the visible spectrum ranges from 0.2% at normal incidence to 0.7% at 40°), good adhesion, and promising environmental durability. These results open up a path to produce ultrahigh performance AR coatings over large area by using industrial-scale magnetron sputtering systems.
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2022
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