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Optimization of Sulfide Annealing Conditions for Ag8SnS6 Thin Films.
Munekata, Ryuki; Uchimura, Tomohiro; Araki, Hideaki; Kanai, Ayaka; Tanaka, Kunihiko; Okamoto, Tomoichiro; Akaki, Yoji.
Afiliación
  • Munekata R; National Institute of Technology (KOSEN), Miyakonojo College, Miyakonojo 885-8567, Japan.
  • Uchimura T; Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, Sendai 980-8576, Japan.
  • Araki H; National Institute of Technology (KOSEN), Nagaoka College, Nagaoka 940-8532, Japan.
  • Kanai A; Department of Electrical, Electronics and Information EngineeringElectronic Device and Light Wave Control Engineering Group, Nagaoka University of Technology, Nagaoka 940-2218, Japan.
  • Tanaka K; Department of Electrical, Electronics and Information EngineeringElectronic Device and Light Wave Control Engineering Group, Nagaoka University of Technology, Nagaoka 940-2218, Japan.
  • Okamoto T; Department of Electrical, Electronics and Information EngineeringElectronic Device and Light Wave Control Engineering Group, Nagaoka University of Technology, Nagaoka 940-2218, Japan.
  • Akaki Y; National Institute of Technology (KOSEN), Miyakonojo College, Miyakonojo 885-8567, Japan.
Materials (Basel) ; 16(18)2023 Sep 19.
Article en En | MEDLINE | ID: mdl-37763566
ABSTRACT
Ag8SnS6 (ATS) has been reported to have a band gap of 1.33 eV and is expected to be a suitable material for the light-absorbing layers of compound thin-film solar cells. However, studies on solar cells that use ATS are currently lacking. The objective of this study is to obtain high-quality ATS thin films for the realization of compound thin-film solar cells using vacuum deposition and sulfide annealing. First, glass/SnS/Ag stacked precursors are prepared by vacuum deposition. Subsequently, they are converted to the ATS phase via sulfide annealing, and various process conditions, namely, annealing time, annealing temperature, and number of steps, are studied. By setting the heat treatment temperature at 550 °C and the heat treatment time at 60 min, a high-quality ATS thin film could be obtained. Multi-step heat treatment also produces thin films with nearly no segregation or voids.
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