RESUMEN
Multilayer coated diffraction gratings are crucial components for extreme ultraviolet (EUV) applications such as spectroscopy or spectro-imaging. However, for high groove density, the smoothening of the grating surface profile with multilayer deposition remains a limitation that requires further investigation. In this paper, we report on the design, characterization, and modeling of 4000 lines/mm diffraction gratings coated with periodic and aperiodic Al/Mo/SiC multilayers for EUV radiation. Two types of gratings with different groove depths are compared. Multilayer coatings were designed using a genetic algorithm to maximize the first-order diffraction efficiency in the 17-21 and 19-23 nm wavelength ranges at normal incidence. Periodic and aperiodic multilayers with different numbers of layers were deposited by magnetron sputtering on the two types of fused silica gratings, and the grating groove profile evolution was measured by atomic force microscopy and cross-section transmission electron microscopy. The first-order diffraction efficiency was measured in the EUV at 5° incidence using monochromatic synchrotron radiation and modeled using the rigorous coupled-wave analysis method. The simulation models refined by using the Debye-Waller factor to account for the multilayer interfacial roughness show good agreement with experimental data. The results reported in this study will allow for designing efficient EUV multilayer gratings for high-resolution spectro-imaging instruments.
RESUMEN
Al/Mo/SiC periodic and aperiodic multilayers were optimized and deposited on high groove density gratings to achieve broadband efficiency in the extreme ultraviolet (EUV). Grating efficiencies were measured by monochromatic synchrotron radiation under 5° and 45° incident angles in the wavelength ranges 17-25 nm and 22-31 nm, respectively. We study the influence of the number of deposited periods on the initial trapezoidal profile and the EUV diffraction efficiency. We propose models of periodic and aperiodic coatings based on a combination of characterizations and compare rigorous coupled-wave analysis (RCWA) simulations with experimental data. We demonstrate the possibility to select the optimal balance between peak efficiency and bandwidth by adjusting the number of periods in the case of periodic multilayer grating. We also report unprecedented broadband diffraction efficiency with an Al/Mo/SiC aperiodic multilayer grating.
RESUMEN
Stitching interferometry is performed by collecting interferometric data from overlapped sub-apertures and stitching these data together to provide a full surface map. The propagation of the systematic error in the measured subset data is one of the main error sources in stitching interferometry for accurate reconstruction of the surface topography. In this work, we propose, using the redundancy of the captured subset data, two types of two-dimensional (2D) self-calibration stitching algorithms to overcome this issue by in situ estimating the repeatable high-order additive systematic errors, especially for the application of measuring X-ray mirrors. The first algorithm, called CS short for "Calibrate, and then Stitch", calibrates the high-order terms of the reference by minimizing the de-tilted discrepancies of the overlapped subsets and then stitches the reference-subtracted subsets. The second algorithm, called SC short for "Stitch, and then Calibrate", stitches a temporarily result and then calibrates the reference from the de-tilted discrepancies of the measured subsets and the temporarily stitched result. In the implementation of 2D scans in x- and y-directions, step randomization is introduced to generate nonuniformly spaced subsets which can diminish the periodic stitching errors commonly observed in evenly spaced subsets. The regularization on low-order terms enables a highly flexible option to add the curvature and twist acquired by another system. Both numerical simulations and experiments are carried out to verify the proposed method. All the results indicate that 2D high-order repeatable additive systematic errors can be retrieved from the 2D redundant overlapped data in stitching interferometry.
RESUMEN
A soft x-ray spectrometer based on the use of an elliptical focusing mirror and a plane varied line spacing grating is described. It achieves both high resolution and high overall efficiency while remaining relatively compact. The instrument is dedicated to resonant inelastic x-ray scattering studies. We set out how this optical arrangement was judged best able to guarantee performance for the 50 - 1000 eV range within achievable fabrication targets. The AERHA (adjustable energy resolution high acceptance) spectrometer operates with an effective angular acceptance between 100 and 250 µsr (energy dependent) and a resolving power well in excess of 5000 according to the Rayleigh criterion. The high angular acceptance is obtained by means of a collecting pre-mirror. Three scattering geometries are available to enable momentum dependent measurements with 135°, 90°, and 50° scattering angles. The instrument operates on the Synchrotron SOLEIL SEXTANTS beamline which serves as a high photon flux 2 × 200 µm(2) focal spot source with full polarization control.
RESUMEN
An alternate multilayer (AML) grating has been prepared by coating an ion etched lamellar grating with a B4C/Mo2C multilayer (ML) having a layer thickness close to the groove depth. Such a structure behaves as a 2D synthetic crystal and can reach very high efficiencies when the Bragg condition is satisfied. This AML coated grating has been characterized at the SOLEIL Metrology and Tests Beamline between 0.7 and 1.7 keV and at the four-crystal monochromator beamline of Physikalisch-Technische Bundesanstalt (PTB) at BESSY II between 1.75 and 3.4 keV. A peak diffraction efficiency of nearly 27% was measured at 2.2 keV. The measured efficiencies are well reproduced by numerical simulations made with the electromagnetic propagation code CARPEM. Such AML gratings, paired with a matched ML mirror, constitute efficient monochromators for intermediate energy photons. They will extend the accessible energy for many applications as x-ray absorption spectroscopy or x-ray magnetic circular dichroism experiments.
RESUMEN
Purine metabolism is crucial in living cells and involves three complex pathways in plants: the de novo synthesis, the salvage, and the degradation pathways. The relative importance of each pathway in plant development and reproduction, however, is still unclear. We identified two T-DNA insertions in the Arabidopsis (Arabidopsis thaliana) PUR4 gene (At1g74260) that encodes formylglycinamidine ribonucleotide synthase (EC 6.3.5.3), the fourth enzyme in the de novo purine biosynthesis pathway. The mutated alleles were never transmitted through the pollen of heterozygous plants but could be inherited through the female gametophyte, indicating that de novo purine synthesis is specifically necessary for pollen development. Because the pur4 mutations were lethal to the male gametophyte, homozygous pur4 plants could not be obtained. However, the reproductive phenotype of hetererozygous plants carrying the pur4-2 mutated allele was more severe than that carrying the pur4-1 mutated allele, and pur4-2/+ plants showed slightly delayed early development. We showed that the pur4-2 allele produces an antisense transcript and that the amount of PUR4 mRNA is reduced in these plants. Transient expression of a translational fusion with the green fluorescent protein in Arabidopsis plantlets showed that the formylglycinamidine ribonucleotide synthase protein is dually targeted to chloroplast and mitochondria, suggesting that at least some steps of the de novo purine biosynthesis pathway can take place in both organelles in Arabidopsis, a dual location previously thought to be a peculiarity of ureide-forming tropical legumes.
Asunto(s)
Arabidopsis/crecimiento & desarrollo , Genes Letales , Genes de Plantas , Mutación , Arabidopsis/genética , Datos de Secuencia Molecular , ARN Mensajero/genética , Reacción en Cadena de la Polimerasa de Transcriptasa InversaRESUMEN
The recent development of short-wavelength optics (X/EUV, synchrotrons) requires improved metrology techniques in terms of accuracy and curvature dynamic range. In this article a stitching Shack-Hartmann head dedicated to be mounted on translation stages for the characterization of X-ray mirrors is presented. The principle of the instrument is described and experimental results for an X-ray toroidal mirror are presented. Submicroradian performances can be achieved and systematic comparison with a classical long-trace profiler is presented. The accuracy and wide dynamic range of the Shack-Hartmann long-trace-profiler head allow two-dimensional characterizations of surface figure and curvature with a submillimeter spatial resolution.