Electrodeposition of Gold to Conformally Fill High Aspect Ratio Nanometric Silicon Grating Trenches: A Comparison of Pulsed and Direct Current Protocols.
J Surf Eng Mater Adv Technol
; 5(4): 207-213, 2015 Oct.
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| MEDLINE
| ID: mdl-27042384
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J Surf Eng Mater Adv Technol
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2015
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Article