Surface Properties of Nanostructured, Porous ZnO Thin Films Prepared by Direct Current Reactive Magnetron Sputtering.

Kwoka, Monika; Lyson-Sypien, Barbara; Kulis, Anna; Maslyk, Monika; Borysiewicz, Michal Adam; Kaminska, Eliana; Szuber, Jacek.

Afiliación

Kwoka M; Institute of Electronics, Silesian University of Technology, 44-100 Gliwice, Poland. Monika.Kwoka@polsl.pl.
Lyson-Sypien B; Institute of Electronics, Silesian University of Technology, 44-100 Gliwice, Poland. Barbara.Lyson-Sypien@polsl.pl.
Kulis A; Institute of Electronics, Silesian University of Technology, 44-100 Gliwice, Poland. Anna.Kulis@polsl.pl.
Maslyk M; Institute of Electron Technology, 02-668 Warsaw, Poland. mmaslyk@ite.waw.pl.
Borysiewicz MA; Institute of Electron Technology, 02-668 Warsaw, Poland. mbory@ite.waw.pl.
Kaminska E; Institute of Electron Technology, 02-668 Warsaw, Poland. eliana@ite.waw.pl.
Szuber J; Institute of Electronics, Silesian University of Technology, 44-100 Gliwice, Poland. Jacek.Szuber@polsl.pl.

Materials (Basel) ; 11(1)2018 Jan 14.

Article en En | MEDLINE | ID: mdl-29342888