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Enhanced Transmission and Self-Cleaning of Patterned Sapphire Substrates Prepared by Wet Chemical Etching Using Silica Masks.
Wang, Gui-Gen; Lin, Zhao-Qing; Zhao, Dong-Dong; Han, Jie-Cai.
Afiliación
  • Wang GG; Shenzhen Key Laboratory for Advanced Materials, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen 518055 , P. R. China.
  • Lin ZQ; Centre for Programmable Materials, School of Materials Science and Engineering , Nanyang Technological University , Singapore 639798 , Singapore.
  • Zhao DD; Shenzhen Key Laboratory for Advanced Materials, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen 518055 , P. R. China.
  • Han JC; Shenzhen Key Laboratory for Advanced Materials, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen 518055 , P. R. China.
Langmuir ; 34(30): 8898-8903, 2018 07 31.
Article en En | MEDLINE | ID: mdl-29979878
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Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Langmuir Asunto de la revista: QUIMICA Año: 2018 Tipo del documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar en Google

Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Langmuir Asunto de la revista: QUIMICA Año: 2018 Tipo del documento: Article