Tolerance to Stretching in Thiol-Terminated Single-Molecule Junctions Characterized by Surface-Enhanced Raman Scattering.

Kobayashi, S; Kaneko, S; Kiguchi, M; Tsukagoshi, K; Nishino, T.

Afiliación

Kobayashi S; Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1 W4-10 Ookayama, Meguro-ku, Tokyo 152-8551, Japan.
Kaneko S; Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1 W4-10 Ookayama, Meguro-ku, Tokyo 152-8551, Japan.
Kiguchi M; JST PRESTO, 4-1-8 Honcho, Kawaguchi 332-0012, Japan.
Tsukagoshi K; Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1 W4-10 Ookayama, Meguro-ku, Tokyo 152-8551, Japan.
Nishino T; International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), 1-1 Tsukuba, Ibaraki 305-0044, Japan.

J Phys Chem Lett ; 11(16): 6712-6717, 2020 Aug 20.

Article en En | MEDLINE | ID: mdl-32619093

Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: J Phys Chem Lett Año: 2020 Tipo del documento: Article

Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: J Phys Chem Lett Año: 2020 Tipo del documento: Article