Fabrication process and failure analysis for robust quantum dots in silicon.

Dodson, J P; Holman, Nathan; Thorgrimsson, Brandur; Neyens, Samuel F; MacQuarrie, E R; McJunkin, Thomas; Foote, Ryan H; Edge, L F; Coppersmith, S N; Eriksson, M A

Dodson, J P; Holman, Nathan; Thorgrimsson, Brandur; Neyens, Samuel F; MacQuarrie, E R; McJunkin, Thomas; Foote, Ryan H; Edge, L F; Coppersmith, S N; Eriksson, M A.

Afiliación

Dodson JP; Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America.
Holman N; Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America.
Thorgrimsson B; Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America.
Neyens SF; Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America.
MacQuarrie ER; Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America.
McJunkin T; Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America.
Foote RH; Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America.
Edge LF; HRL Laboratories, LLC, 3011 Malibu Canyon Road, Malibu, CA 90265, United States of America.
Coppersmith SN; Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America.
Eriksson MA; University of New South Wales, Sydney, Australia.

Nanotechnology ; 31(50): 505001, 2020 Dec 11.

Article en En | MEDLINE | ID: mdl-33043895

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Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2020 Tipo del documento: Article

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Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2020 Tipo del documento: Article