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Nanomechanical Resonators: Toward Atomic Scale.
Xu, Bo; Zhang, Pengcheng; Zhu, Jiankai; Liu, Zuheng; Eichler, Alexander; Zheng, Xu-Qian; Lee, Jaesung; Dash, Aneesh; More, Swapnil; Wu, Song; Wang, Yanan; Jia, Hao; Naik, Akshay; Bachtold, Adrian; Yang, Rui; Feng, Philip X-L; Wang, Zenghui.
Afiliación
  • Xu B; Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu610054, China.
  • Zhang P; University of Michigan-Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai200240, China.
  • Zhu J; Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu610054, China.
  • Liu Z; University of Michigan-Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai200240, China.
  • Eichler A; Department of Physics, ETH Zurich, 8093Zurich, Switzerland.
  • Zheng XQ; Department of Electrical and Computer Engineering, Herbert Wertheim College of Engineering, University of Florida, Gainesville, Florida32611, United States.
  • Lee J; College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing210023, China.
  • Dash A; Department of Electrical and Computer Engineering, Herbert Wertheim College of Engineering, University of Florida, Gainesville, Florida32611, United States.
  • More S; Department of Electrical and Computer Engineering, University of Texas at El Paso, El Paso, Texas79968, United States.
  • Wu S; Centre for Nano Science and Engineering, Indian Institute of Science, Bangalore560012, Karnataka, India.
  • Wang Y; Centre for Nano Science and Engineering, Indian Institute of Science, Bangalore560012, Karnataka, India.
  • Jia H; Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu610054, China.
  • Naik A; Department of Electrical and Computer Engineering, Herbert Wertheim College of Engineering, University of Florida, Gainesville, Florida32611, United States.
  • Bachtold A; Department of Electrical and Computer Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska68588, United States.
  • Yang R; Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai200050, China.
  • Feng PX; Centre for Nano Science and Engineering, Indian Institute of Science, Bangalore560012, Karnataka, India.
  • Wang Z; ICFO-Institut de Ciencies Fotoniques, The Barcelona Institute of Science and Technology, Castelldefels, Barcelona08860, Spain.
ACS Nano ; 16(10): 15545-15585, 2022 Oct 25.
Article en En | MEDLINE | ID: mdl-36054880

Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: ACS Nano Año: 2022 Tipo del documento: Article

Texto completo: 1 Base de datos: MEDLINE Idioma: En Revista: ACS Nano Año: 2022 Tipo del documento: Article