Controllable Subtractive Nanoimprint Lithography for Precisely Fabricating Paclitaxel-Loaded PLGA Nanocylinders to Enhance Anticancer Efficacy.
ACS Appl Mater Interfaces
; 12(13): 14797-14805, 2020 Apr 01.
Article
en En
| MEDLINE
| ID: mdl-32160750
ABSTRACT
Nanoimprint lithography presents a new strategy for preparing uniform nanostructures with predefined sizes and shapes and has the potential for developing nanosized drug delivery systems. However, the current nanoimprint lithography is a type of an additive nanofabrication method that has limited potential due to its restricted template-dependent innate character. Herein, we have developed a novel subtractive UV-nanoimprint lithography (sUNL) for the scalable fabrication of PLGA nanostructures with variable sizes for the first time. sUNL can not only fabricate a variety of predefined nanostructures by simply utilizing different nanoimprint molds but also precisely prepare scalable nanocylinders with different length to diameter ratios. Particularly, sUNL can fabricate paclitaxel-loaded PLGA nanocylinders (PTX-PLGA NCs) with high drug-loading rate of 40% and long storage stability over a year. We demonstrate that PTX-PLGA NCs target clathrin- and caveolae-mediated cell transport pathways and display increased cellular uptake, in comparison to traditional PTX-loaded PLGA nanoparticles (PTX-PLGA NPs), leading to enhanced anticancer effects. Therefore, sUNL represents a promising nanofabrication method for efficiently developing predefined drug delivery systems.
Palabras clave
Texto completo:
1
Banco de datos:
MEDLINE
Asunto principal:
Portadores de Fármacos
/
Paclitaxel
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Nanoestructuras
/
Bioimpresión
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Copolímero de Ácido Poliláctico-Ácido Poliglicólico
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Antineoplásicos Fitogénicos
Límite:
Humans
Idioma:
En
Revista:
ACS Appl Mater Interfaces
Asunto de la revista:
BIOTECNOLOGIA
/
ENGENHARIA BIOMEDICA
Año:
2020
Tipo del documento:
Article
País de afiliación:
China