Nanoscale charge transfer and diffusion at the MoS<sub>2</sub>/SiO<sub>2</sub> interface by atomic force microscopy: contact injection versus triboelectrification.

Nanoscale charge transfer and diffusion at the MoS₂/SiO₂ interface by atomic force microscopy: contact injection versus triboelectrification.

Xu, Rui; Ye, Shili; Xu, Kunqi; Lei, Le; Hussain, Sabir; Zheng, Zhiyue; Pang, Fei; Xing, Shuya; Liu, Xinmeng; Ji, Wei; Cheng, Zhihai.

Afiliación

Xu R; CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China. Department of Physics and Beijing Key Laboratory of Optoelectronic Functional Materials & Micro-nano Devices, Renmin University of China, Beijing 100872, People's Republic of China.

Nanotechnology ; 29(35): 355701, 2018 Aug 31.

Article en En | MEDLINE | ID: mdl-29873636

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2018 Tipo del documento: Article

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2018 Tipo del documento: Article