Linear magnetoresistance in the low-field limit in density-wave materials.

Feng, Yejun; Wang, Yishu; Silevitch, D M; Yan, J-Q; Kobayashi, Riki; Hedo, Masato; Nakama, Takao; Onuki, Yoshichika; Suslov, A V; Mihaila, B; Littlewood, P B; Rosenbaum, T F

Feng, Yejun; Wang, Yishu; Silevitch, D M; Yan, J-Q; Kobayashi, Riki; Hedo, Masato; Nakama, Takao; Onuki, Yoshichika; Suslov, A V; Mihaila, B; Littlewood, P B; Rosenbaum, T F.

Afiliación

Feng Y; Okinawa Institute of Science and Technology Graduate University, Onna, 904-0495 Okinawa, Japan; yejun@oist.jp tfr@caltech.edu.
Wang Y; Division of Physics, Mathematics, and Astronomy, California Institute of Technology, Pasadena, CA 91125.
Silevitch DM; Division of Physics, Mathematics, and Astronomy, California Institute of Technology, Pasadena, CA 91125.
Yan JQ; Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831.
Kobayashi R; Okinawa Institute of Science and Technology Graduate University, Onna, 904-0495 Okinawa, Japan.
Hedo M; Faculty of Science, University of the Ryukyus, Nishihara, 903-0213 Okinawa, Japan.
Nakama T; Faculty of Science, University of the Ryukyus, Nishihara, 903-0213 Okinawa, Japan.
Onuki Y; Faculty of Science, University of the Ryukyus, Nishihara, 903-0213 Okinawa, Japan.
Suslov AV; Faculty of Science, University of the Ryukyus, Nishihara, 903-0213 Okinawa, Japan.
Mihaila B; National High Magnetic Field Laboratory, Tallahassee, FL 32310.
Littlewood PB; National Science Foundation, Arlington, VA 22230.
Rosenbaum TF; The James Franck Institute, The University of Chicago, Chicago, IL 60637.