Characteristics of Cobalt Thin Films Deposited by Very High Frequency Plasma Enhanced Atomic Layer Deposition (60 and 100 MHz) Using Cobaltocene (Co(Cp)2)/NH3.

Yeom, Won Gyun; Song, Chang Hoon; Cho, Chul Hee; You, Shin Jae; Yeom, Geun Young

Yeom, Won Gyun; Song, Chang Hoon; Cho, Chul Hee; You, Shin Jae; Yeom, Geun Young.

Afiliación

Yeom WG; SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea.
Song CH; School of Advanced Materials Science and Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea.
Cho CH; Applied Physic Lab for Plasma Engineering, Department of Physic, Chungnam National University, Daegeon 34134, South Korea.
You SJ; Applied Physic Lab for Plasma Engineering, Department of Physic, Chungnam National University, Daegeon 34134, South Korea.
Yeom GY; SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea.

J Nanosci Nanotechnol ; 21(3): 1826-1832, 2021 Mar 01.

Article en En | MEDLINE | ID: mdl-33404456

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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: J Nanosci Nanotechnol Año: 2021 Tipo del documento: Article

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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: J Nanosci Nanotechnol Año: 2021 Tipo del documento: Article