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Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled.
Jeong, Won-Nyoung; Lee, Young-Seok; Cho, Chul-Hee; Seong, In-Ho; You, Shin-Jae.
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  • Jeong WN; Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
  • Lee YS; Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
  • Cho CH; Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
  • Seong IH; Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
  • You SJ; Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea.
Nanomaterials (Basel) ; 12(24)2022 Dec 15.
Article en En | MEDLINE | ID: mdl-36558310
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Texto completo: 1 Banco de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Nanomaterials (Basel) Año: 2022 Tipo del documento: Article
Texto completo
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PubMed Links
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Texto completo: 1 Banco de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Nanomaterials (Basel) Año: 2022 Tipo del documento: Article