Rotational Dynamics of Water at the Phospholipid Bilayer Depending on the Head Groups Studied by Molecular Dynamics Simulations.

Hydration states are a crucial factor that affect the self-assembly and properties of soft materials and biomolecules. Although previous experiments have revealed that the hydration state strongly depends on the chemical structure of lipid molecules, the mechanisms at the molecular level remain unknown. Classical and density-functional tight-binding (DFTB) molecular dynamics (MD) simulations are employed to determine the mechanisms underlying dissimilar water dynamics between lipid membranes with phosphatidylcholine (PC) and phosphatidylethanolamine (PE) head groups. The classical MD simulation shows that rotational relaxations of water are faster on the PE lipid than on the PC lipid, which is consistent with a previous experimental study using terahertz spectroscopy. Furthermore, DFTB-MD simulation of N(CH3)4+ and NH4+ ions, which correspond to the different head groups in PC and PE, respectively, shows qualitative agreement with the classical MD simulation. Remarkably, the PE lipids and the NH4+ ions break hydrogen bonds between water molecules in the secondary hydration shell. In contrast, the PC lipids and the N(CH3)4+ ions bind water molecules weakly in both the primary and secondary hydration shells and increase hydrogen bonds between water. Our atomistic simulations show that these changes in the hydrogen-bond network of water molecules cause the different rotational relaxation of water molecules between the two lipids.

Friction Regimes of Water-Lubricated Diamond (111): Role of Interfacial Ether Groups and Tribo-Induced Aromatic Surface Reconstructions.

Large-scale quantum molecular dynamics of water-lubricated diamond (111) surfaces in sliding contact reveals multiple friction regimes. While water starvation causes amorphization of the tribological interface, small H_{2}O traces are sufficient to preserve crystallinity. This can result in high friction due to cold welding via ether groups or in ultralow friction due to aromatic surface passivation triggered by tribo-induced Pandey reconstruction. At higher water coverage, Grotthuss-type diffusion and H_{2}O dissociation yield dense H/OH surface passivation leading to another ultralow friction regime.

Tight-binding quantum chemical molecular dynamics simulations for the elucidation of chemical reaction dynamics in SiC etching with SF6/O2 plasma.

We used our etching simulator [H. Ito et al., J. Phys. Chem. C, 2014, 118, 21580-21588] based on tight-binding quantum chemical molecular dynamics (TB-QCMD) to elucidate SiC etching mechanisms. First, the SiC surface is irradiated with SF5 radicals, which are the dominant etchant species in experiments, with the irradiation energy of 300 eV. After SF5 radicals bombard the SiC surface, Si-C bonds dissociate, generating Si-F, C-F, Si-S, and C-S bonds. Then, etching products, such as SiS, CS, SiFx, and CFx (x = 1-4) molecules, are generated and evaporated. In particular, SiFx is the main generated species, and Si atoms are more likely to vaporize than C atoms. The remaining C atoms on SiC generate C-C bonds that may decrease the etching rate. Interestingly, far fewer Si-Si bonds than C-C bonds are generated. We also simulated SiC etching with SF3 radicals. Although the chemical reaction dynamics are similar to etching with SF5 radicals, the etching rate is lower. Next, to clarify the effect of O atom addition on the etching mechanism, we also simulated SiC etching with SF5 and O radicals/atoms. After bombardment with SF5 radicals, Si-C bonds dissociate in a similar way to the etching without O atoms. In addition, O atoms generate many C-O bonds and COy (y = 1-2) molecules, inhibiting the generation of C-C bonds. This indicates that O atom addition improves the removal of C atoms from SiC. However, for a high O concentration, many C-C and Si-Si bonds are generated. When the O atoms dissociate the Si-C bonds and generate dangling bonds, the O atoms terminate only one or two dangling bonds. Moreover, at high O concentrations there are fewer S and F atoms to terminate the dangling bonds than at low O concentration. Therefore, few dangling bonds of dissociated Si and C atoms are terminated, and they form many Si-Si and C-C bonds. Furthermore, we propose that the optimal O concentration is 50-60% because both Si and C atoms generate many etching products producing fewer C-C and Si-Si bonds are generated. Finally, we conclude that our TB-QCMD etching simulator is effective for designing the optimal conditions for etching processes in which chemical reactions play a significant role.

Surface Depassivation via B-O Dative Bonds Affects the Friction Performance of B-Doped Carbon Coatings.

Boron doping of diamond-like carbon coatings has multiple effects on their tribological properties. While boron typically reduces wear in cutting applications, some B-doped coatings show poor tribological performance compared with undoped films. This is the case of the tribological tests presented in this work in which an alumina ball is placed in frictional contact with different undoped and B-doped amorphous carbon coatings in humid air. With B-doped coatings, a higher friction coefficient at a steady state with respect to their undoped counterparts was observed. Estimates of the average contact shear stress based on experimental friction coefficients, surface topographies, and Persson's contact theory suggest that the increased friction is compatible with the formation of a sparse network of interfacial ether bonds leading to a mild cold-welding friction regime, as documented in the literature. Tight binding and density functional theory simulations were performed to investigate the chemical effect of B-doping on the interfacial properties of the carbon coatings. The results reveal that OH groups that normally passivate carbon surfaces in humid environments can be activated by boron and form B-O dative bonds across the tribological interfaces, leading to a mild cold-welding friction regime. Simulations performed on different tribological pairs suggest that this mechanism could be valid for B-doped carbon surfaces in contact with a variety of materials. In general, this study highlights the impact that subtle modifications in surface and interface chemistry caused by the presence of impurities can have on macroscopic properties, such as friction and wear.

Superlubricity of Silicon-Based Ceramics Sliding against Hydrogenated Amorphous Carbon in Ultrahigh Vacuum: Mechanisms of Transfer Film Formation.

Tribological interfaces between silicon-based ceramics, such as Si3N4 or SiC, are characterized by high friction and wear in unlubricated conditions. A solution to this problem is to use them in combination with a hydrogenated amorphous carbon (a-C:H) countersurface from which a passivating carbon film is transferred onto the ceramic surface. However, the mechanisms underlying a stable film transfer process and the conditions that favor it remain elusive. Here, we present friction experiments in ultrahigh vacuum in which friction coefficients lower than 0.01 are achieved by sliding Si3N4 against a-C:H with 36 at. % hydrogen but not against a-C:H with 20 at. % hydrogen. Chemical surface analyses confirm that the superlubric interface forms via the transfer of a hydrocarbon nanofilm onto the Si3N4 surface. Quantum-mechanical simulations reveal that a stable passivating a-C:H film can only be transferred if, after initial cold welding of the tribological interface, the plastic shear deformation is localized within the a-C:H coating. This occurs if the yield shear stress for plastic flow of a-C:H is lower than that of the ceramic and of the shear strength of the a-C:H-ceramic interface, i.e., if the a-C:H hydrogen content ranges between ∼30 and ∼50 at. %. While the importance of a relatively high hydrogen content to achieve an efficient passivation of a-C:H surfaces in a vacuum is well-documented, this work reveals how the hydrogen content is also crucial for obtaining a stable a-C:H transfer film. These results can be extended to glass, SiC, and steel, supporting the generality of the proposed mechanism.

Odor removal characteristics of a laminated film-electrode packed-bed nonthermal plasma reactor.

Odor control has gained importance for ensuring a comfortable living environment. In this paper, the authors report the experimental results of a study on the detailed characteristics of a laminated film-electrode and a laminated film-electrode packed-bed nonthermal plasma reactor, which are types of dielectric barrier discharge (DBD) reactor used for odor control. These plasma reactors can be potentially used for the decomposition of volatile organic compounds (VOCs) and reduction of NO(x). The reactor is driven by a low-cost 60-Hz neon transformer. Removal efficiencies under various experimental conditions are studied. The complete decomposition of the main odor component, namely, NH(3), is achieved in a dry environment. The retention times are investigated for the complete removal of NH(3) in the case of the film-electrode plasma reactor and the film-electrode packed-bed plasma reactor. The removal efficiency of the former reactor is lower than that of the latter reactor. Mixing another odor component such as CH(3)CHO in the gas stream has no significant effect on NH(3) removal efficiency.

Interplay of mechanics and chemistry governs wear of diamond-like carbon coatings interacting with ZDDP-additivated lubricants.

Friction and wear reduction by diamond-like carbon (DLC) in automotive applications can be affected by zinc-dialkyldithiophosphate (ZDDP), which is widely used in engine oils. Our experiments show that DLC's tribological behaviour in ZDDP-additivated oils can be optimised by tailoring its stiffness, surface nano-topography and hydrogen content. An optimal combination of ultralow friction and negligible wear is achieved using hydrogen-free tetrahedral amorphous carbon (ta-C) with moderate hardness. Softer coatings exhibit similarly low wear and thin ZDDP-derived patchy tribofilms but higher friction. Conversely, harder ta-Cs undergo severe wear and sub-surface sulphur contamination. Contact-mechanics and quantum-chemical simulations reveal that shear combined with the high local contact pressure caused by the contact stiffness and average surface slope of hard ta-Cs favour ZDDP fragmentation and sulphur release. In absence of hydrogen, this is followed by local surface cold welding and sub-surface mechanical mixing of sulphur resulting in a decrease of yield stress and wear.

Steric Effects Control Dry Friction of H- and F-Terminated Carbon Surfaces.

A stable passivation of surface dangling bonds underlies the outstanding friction properties of diamond and diamond-like carbon (DLC) coatings in boundary lubrication. While hydrogen is the simplest termination of a carbon dangling bond, fluorine can also be used as a monoatomic termination, providing an even higher chemical stability. However, whether and under which conditions a substitution of hydrogen with fluorine can be beneficial to friction is still an open question. Moreover, which of the chemical differences between C-H and C-F bonds are responsible for the change in friction has not been unequivocally understood yet. In order to shed light on this problem, we develop a density functional theory-based, nonreactive force field that describes the relevant properties of hydrogen- and fluorine-terminated diamond and DLC tribological interfaces. Molecular dynamics and nudged elastic band simulations reveal that the frictional stress at such interfaces correlates with the corrugation of the contact potential energy, thus ruling out a significant role of the mass of the terminating species on friction. Furthermore, the corrugation of the contact potential energy is almost exclusively determined by steric factors, while electrostatic interactions only play a minor role. In particular, friction between atomically flat diamond surfaces is controlled by the density of terminations, by the C-H and C-F bond lengths, and by the H and F atomic radii. For sliding DLC/DLC interfaces, the intrinsic atomic-scale surface roughness plays an additional role. While surface fluorination decreases the friction of incommensurate diamond contacts, it can negatively affect the friction performance of carbon surfaces that are disordered and not atomically flat. This work provides a general framework to understand the impact of chemical structure of surfaces on friction and to generate design rules for optimally terminated low-friction systems.

Mechano-chemical decomposition of organic friction modifiers with multiple reactive centres induces superlubricity of ta-C.

Superlubricity of tetrahedral amorphous carbon (ta-C) coatings under boundary lubrication with organic friction modifiers is important for industrial applications, but the underlying mechanisms remain elusive. Here, combined experiments and simulations unveil a universal tribochemical mechanism leading to superlubricity of ta-C/ta-C tribopairs. Pin-on-disc sliding experiments show that ultra- and superlow friction with negligible wear can be achieved by lubrication with unsaturated fatty acids or glycerol, but not with saturated fatty acids and hydrocarbons. Atomistic simulations reveal that, due to the simultaneous presence of two reactive centers (carboxylic group and C=C double bond), unsaturated fatty acids can concurrently chemisorb on both ta-C surfaces and bridge the tribogap. Sliding-induced mechanical strain triggers a cascade of molecular fragmentation reactions releasing passivating hydroxyl, keto, epoxy, hydrogen and olefinic groups. Similarly, glycerol's three hydroxyl groups react simultaneously with both ta-C surfaces, causing the molecule's complete mechano-chemical fragmentation and formation of aromatic passivation layers with superlow friction.

Continuous reduction of cyclic adsorbed and desorbed NO(x) in diesel emission using nonthermal plasma.

Considering the recent stringent regulations governing diesel NO(x) emission, an aftertreatment system for the reduction of NO(x) in the exhaust gas has been proposed and studied. The proposed system is a hybrid method combining nonthermal plasma and NOx adsorbent. The system does not require precious metal catalysts or harmful chemicals such as urea and ammonia. In the present system, NO(x) in diesel emission is treated by adsorption and desorption by adsorbent as well as nonthermal plasma reduction. In addition, the remaining NO(x) in the adsorbent is desorbed again in the supplied air by residual heat. The desorbed NO(x) in air recirculates into the intake of the engine, and this process, i.e., exhaust gas components' recirculation (EGCR) achieves NO(x) reduction. Alternate utilization of two adsorption chambers in the system can achieve high-efficiency NO(x) removal continuously. An experiment with a stationary diesel engine for electric power generation demonstrates an energy efficiency of 154 g(NO2)/kWh for NO(x) removal and continuous NO(x) reduction of 70.3%. Considering the regulation against diesel emission in Japan, i.e., the new regulation to be imposed on vehicles of 3.5-7.5 ton since 2016, the present aftertreatment system fulfills the requirement with only 1.0% of engine power.

Atomistic Mechanisms of Chemical Mechanical Polishing of a Cu Surface in Aqueous H2O2: Tight-Binding Quantum Chemical Molecular Dynamics Simulations.

We applied our original chemical mechanical polishing (CMP) simulator based on the tight-binding quantum chemical molecular dynamics (TB-QCMD) method to clarify the atomistic mechanism of CMP processes on a Cu(111) surface polished with a SiO2 abrasive grain in aqueous H2O2. We reveal that the oxidation of the Cu(111) surface mechanically induced at the friction interface is a key process in CMP. In aqueous H2O2, in the first step, OH groups and O atoms adsorbed on a nascent Cu surface are generated by the chemical reactions of H2O2 molecules. In the second step, at the friction interface between the Cu surface and the abrasive grain, the surface-adsorbed O atom intrudes into the Cu bulk and dissociates the Cu-Cu bonds. The dissociation of the Cu-Cu back-bonds raises a Cu atom from the surface that is mechanically sheared by the abrasive grain. In the third step, the raised Cu atom bound to the surface-adsorbed OH groups is removed from the surface by the generation and desorption of a Cu(OH)2 molecule. In contrast, in pure water, there are no geometrical changes in the Cu surface because the H2O molecules do not react with the Cu surface, and the abrasive grain slides smoothly on the planar Cu surface. The comparison between the CMP simulations in aqueous H2O2 and pure water indicates that the intrusion of a surface-adsorbed O atom into the Cu bulk is the most important process for the efficient polishing of the Cu surface because it induces the dissociation of the Cu-Cu bonds and generates raised Cu atoms that are sheared off by the abrasive grain. Furthermore, density functional theory calculations show that the intrusion of the surface-adsorbed O atoms into the Cu bulk has a high activation energy of 28.2 kcal/mol, which is difficult to overcome at 300 K. Thus, we suggest that the intrusion of surface-adsorbed O atoms into the Cu bulk induced by abrasive grains at the friction interface is a rate-determining step in the Cu CMP process.

The reason why thin-film silicon grows layer by layer in plasma-enhanced chemical vapor deposition.

Thin-film Si grows layer by layer on Si(001)-(2 × 1):H in plasma-enhanced chemical vapor deposition. Here we investigate the reason why this occurs by using quantum chemical molecular dynamics and density functional theory calculations. We propose a dangling bond (DB) diffusion model as an alternative to the SiH3 diffusion model, which is in conflict with first-principles calculation results and does not match the experimental evidence. In our model, DBs diffuse rapidly along an upper layer consisting of Si-H3 sites, and then migrate from the upper layer to a lower layer consisting of Si-H sites. The subsequently incident SiH3 radical is then adsorbed onto the DB in the lower layer, producing two-dimensional growth. We find that DB diffusion appears analogous to H diffusion and can explain the reason why the layer-by-layer growth occurs.

Diesel NO(x) aftertreatment by combined process using temperature swing adsorption, NO(x) reduction by nonthermal plasma, and NO(x) recirculation: improvement of the recirculation process.

NO(x) emitted from a stationary diesel engine generator was treated with a hybrid system comprising NO(x) reduction by nonthermal plasma (NTP) and temperature swing adsorption (TSA) driven by engine waste heat. TSA produces a low-volume gas mixture of N(2) and highly concentrated NO(x), which is effectively reduced by NTP treatment. Improved treatment performance and efficiency are achieved by re-injecting the NTP-treated gas mixture into the engine intake. The system comprises two switchable adsorption chambers; the operation of this system was simulated by using a one-chamber system. The maximum energy efficiency for NO(x) treatment is 200 g(NO(2))/kWh. The respective contributions of NTP and injection of N(2) and NO(x) to the performance were theoretically analyzed. The analysis predicts that high energy efficiency and high NO(x)-removal efficiency can be simultaneously achieved with this system but miniaturization of the adsorption chambers will be a challenge.