Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary-ion mass spectrometry (SIMS).

Secondary-ion mass spectrometry is frequently used for concentration-depth profiling of macroscopic samples, but it is certainly not a common analytical technique for the analysis of sub-micrometer-size particles. This is because of the additional ion-bombardment-induced artifacts which can occur when a three-dimensional microvolume is sputtered, instead of a flat surface. This paper presents a model of how small cubic photographic Ag(Cl,Br) crystals are eroded under primary-ion bombardment, and the extent to which secondary ions generated at different faces are extracted. The latter is studied by means of the program SIMION, which simulates ion trajectories in complex electrical field systems. It is shown that up to 90% of the secondary ions originating from the side face of a cubic crystal are unable to reach the detector, in contrast with most secondary ions originating from the top face. The angular dependence of the sputtering yield and the elemental ratio of Br/Cl sputtered particles have been calculated by using the well-known computer code TRIM (transport of ions in matter) under some limiting assumptions (possible preferential sputtering is disregarded and a steady-state sputtering process is assumed). The validity of the theoretical model and the calculated results were checked with experimental data. On the basis of the depth profiles presented it is explained why it is still possible to measure an interface inside a cubic volume, even though a group of several hundred crystals is sputtered simultaneously, and even though the orientations of the distinct faces of the cubes relative to the angle of incidence of the primary-ion beam are different.

Automated Particle Analysis of Populations of Silver Halide Microcrystals by Electron Probe Microanalysis under Cryogenic Conditions.

An automated particle analysis routine is implemented on an electron microprobe for analyzing the chemical composition and projective area of populations of individual silver halide microcrystals. An LN2 cryostage is used to prevent material degradation due to reaction with the impinging electron beam. The background in the EDX spectra is lowered by depositing the microcrystals on a carbon-coated copper grid, mounted in a transmission holder. The ILα/AgLα net X-ray intensity ratio, obtained from a spectrum-fitting algorithm, is used to determine the crystal composition by means of a standard-based calibration curve. The uncertainty on the concentration measurement of individual microcrystals is calculated using the uncertainties on the net X-ray counts and the uncertainties on the calibration curve. The area measurement is optimized by introducing a gray value histogram correction on each individual measurement. Overlapping microcrystals are scrapped from the analysis by defining a maximum shape factor, against which the shape factor of the microcrystal is tested. To minimize problems with drift of the cryostage, spectrum acquisition is carried out immediately after a single microcrystal has been located, based on the backscattered electron image. Several applications are discussed.