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1.

Optical micro-phase-shift dropvolume in a diffractive deep neural network.

Xiao, Yong-Liang; Zhang, Zhi-Gang; Li, Sikun; Zhong, Jianxin.

Opt Lett ; 48(12): 3303-3306, 2023 Jun 15.

Artículo en Inglés | MEDLINE | ID: mdl-37319087

2.

Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools.

Niu, Zhiyuan; Li, Sikun; Liu, Yang.

Appl Opt ; 62(18): 4759-4765, 2023 Jun 20.

Artículo en Inglés | MEDLINE | ID: mdl-37707249

3.

Effects and elimination of image grating defocusing on a double-Ronchi shearing interference field.

Liu, Yang; Tang, Feng; Li, Sikun; Wang, Xiangzhao.

Appl Opt ; 62(14): 3623-3631, 2023 May 10.

Artículo en Inglés | MEDLINE | ID: mdl-37706978

4.

Phase defect characterization using generative adversarial networks for extreme ultraviolet lithography.

Zheng, Hang; Li, Sikun; Cheng, Wei; Yuan, Shuai; Wang, Xiangzhao.

Appl Opt ; 62(5): 1243-1252, 2023 Feb 10.

Artículo en Inglés | MEDLINE | ID: mdl-36821224

5.

Optical random micro-phase-shift DropConnect in a diffractive deep neural network.

Xiao, Yong-Liang; Li, Sikun; Situ, Guohai; Zhong, Jianxin.

Opt Lett ; 47(7): 1746-1749, 2022 Apr 01.

Artículo en Inglés | MEDLINE | ID: mdl-35363725

6.

Through-focus EUV multilayer defect compensation considering optical proximity correction.

Cheng, Wei; Li, Sikun; Wang, Xiangzhao; Zhang, Zinan.

Appl Opt ; 61(15): 4437-4448, 2022 May 20.

Artículo en Inglés | MEDLINE | ID: mdl-36256282

7.

Effects of illumination non-uniformity on the double-Ronchi lateral shearing interference field.

Liu, Yang; Tang, Feng; Li, Sikun; Wang, Xiangzhao; Su, Rong.

Appl Opt ; 61(34): 10299-10308, 2022 Dec 01.

Artículo en Inglés | MEDLINE | ID: mdl-36606796

8.

Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling.

Zhang, Zinan; Li, Sikun; Wang, Xiangzhao; Cheng, Wei.

Opt Express ; 29(14): 22778-22795, 2021 Jul 05.

Artículo en Inglés | MEDLINE | ID: mdl-34266033

9.

Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling.

Chen, Guodong; Li, Sikun; Wang, Xiangzhao.

Opt Express ; 29(11): 17440-17463, 2021 May 24.

Artículo en Inglés | MEDLINE | ID: mdl-34154287

10.

Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm.

Zhang, Zinan; Li, Sikun; Wang, Xiangzhao; Cheng, Wei; Qi, Yuejing.

Opt Express ; 29(4): 5448-5465, 2021 Feb 15.

Artículo en Inglés | MEDLINE | ID: mdl-33726081

11.

Optical random phase dropout in a diffractive deep neural network.

Xiao, Yong-Liang; Li, Sikun; Situ, Guohai; You, Zhisheng.

Opt Lett ; 46(20): 5260-5263, 2021 Oct 15.

Artículo en Inglés | MEDLINE | ID: mdl-34653167

12.

Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall.

Zhang, Zinan; Li, Sikun; Wang, Xiangzhao; Cheng, Wei.

Appl Opt ; 60(20): 5776-5782, 2021 Jul 10.

Artículo en Inglés | MEDLINE | ID: mdl-34263796

13.

Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images.

Cheng, Wei; Li, Sikun; Wang, Xiangzhao; Zhang, Zinan.

Appl Opt ; 60(17): 5208-5219, 2021 Jun 10.

Artículo en Inglés | MEDLINE | ID: mdl-34143090

14.

Source mask optimization using the covariance matrix adaptation evolution strategy.

Chen, Guodong; Li, Sikun; Wang, Xiangzhao.

Opt Express ; 28(22): 33371-33389, 2020 Oct 26.

Artículo en Inglés | MEDLINE | ID: mdl-33115003

15.

Critical pattern selection method for full-chip source and mask optimization.

Liao, Lufeng; Li, Sikun; Wang, Xiangzhao; Zhang, Libin; Gao, Pengzheng; Wei, Yayi; Shi, Weijie.

Opt Express ; 28(14): 20748-20763, 2020 Jul 06.

Artículo en Inglés | MEDLINE | ID: mdl-32680128

16.

Fast rigorous mask model for extreme ultraviolet lithography.

Zhang, Zinan; Li, Sikun; Wang, Xiangzhao; Cheng, Wei.

Appl Opt ; 59(24): 7376-7389, 2020 Aug 20.

Artículo en Inglés | MEDLINE | ID: mdl-32902506

17.

Micromirror array allocation algorithm based on deconvolution.

Liu, Zhifan; Yang, Chaoxing; Bu, Yang; Li, Sikun; Zhang, Jianhua; Wang, Xiangzhao; Sun, Gang.

Appl Opt ; 59(12): 3582-3588, 2020 Apr 20.

Artículo en Inglés | MEDLINE | ID: mdl-32400477

18.

Fast thermal aberration model for lithographic projection lenses.

Zhu, Boer; Li, Sikun; Mao, Yanjie; Wang, Xiangzhao; Bu, Yang; Wang, Jian; Sun, Gang; Duan, Lifeng.

Opt Express ; 27(23): 34038-34049, 2019 Nov 11.

Artículo en Inglés | MEDLINE | ID: mdl-31878460

19.

Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources.

Meng, Zejiang; Li, Sikun; Wang, Xiangzhao; Bu, Yang; Wang, Jian; Ni, Sheng; Yang, Chaoxing; Mao, Yanjie.

Opt Express ; 27(4): 4629-4647, 2019 Feb 18.

Artículo en Inglés | MEDLINE | ID: mdl-30876077

20.

Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry.

Kamagara, Abel; Wang, Xiangzhao; Li, Sikun.

Appl Opt ; 56(28): 8014-8022, 2017 Oct 01.

Artículo en Inglés | MEDLINE | ID: mdl-29047791

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Optical micro-phase-shift dropvolume in a diffractive deep neural network.

Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools.

Effects and elimination of image grating defocusing on a double-Ronchi shearing interference field.

Phase defect characterization using generative adversarial networks for extreme ultraviolet lithography.

Optical random micro-phase-shift DropConnect in a diffractive deep neural network.

Through-focus EUV multilayer defect compensation considering optical proximity correction.

Effects of illumination non-uniformity on the double-Ronchi lateral shearing interference field.

Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling.

Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling.

Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm.

Optical random phase dropout in a diffractive deep neural network.

Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall.

Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images.

Source mask optimization using the covariance matrix adaptation evolution strategy.

Critical pattern selection method for full-chip source and mask optimization.

Fast rigorous mask model for extreme ultraviolet lithography.

Micromirror array allocation algorithm based on deconvolution.

Fast thermal aberration model for lithographic projection lenses.

Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources.

Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry.