Single digit nanofabrication by step-and-repeat nanoimprint lithography.
Nanotechnology
; 23(1): 015305, 2012 Jan 13.
Article
en En
| MEDLINE
| ID: mdl-22155980
ABSTRACT
A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate.
Texto completo:
1
Colección:
01-internacional
Banco de datos:
MEDLINE
Idioma:
En
Revista:
Nanotechnology
Año:
2012
Tipo del documento:
Article
País de afiliación:
Estados Unidos