Development of a microwave ion source for ion implantations.
Rev Sci Instrum
; 87(2): 02C108, 2016 Feb.
Article
en En
| MEDLINE
| ID: mdl-26932118
ABSTRACT
A microwave ion source is expected to have a long lifetime, as it has fewer consumables. Thus, we are in the process of developing a microwave ion source for ion implantation applications. In this paper, we report on a newly developed plasma chamber and the extracted P(+) beam currents. The volume of the plasma chamber is optimized by varying the length of a boron nitride block installed within the chamber. The extracted P(+) beam current is more than 30 mA, at a 25 kV acceleration voltage, using PH3 gas.
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1
Colección:
01-internacional
Banco de datos:
MEDLINE
Idioma:
En
Revista:
Rev Sci Instrum
Año:
2016
Tipo del documento:
Article
País de afiliación:
Japón