Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator-Metal Transition Behavior. Materials 2019, 12, 2160.

Zhang, Chunzi; Gunes, Ozan; Li, Yuanshi; Cui, Xiaoyu; Mohammadtaheri, Masoud; Wen, Shi-Jie; Wong, Rick; Yang, Qiaoqin; Kasap, Safa

Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO₂ Thin Films and Their Insulator-Metal Transition Behavior. Materials 2019, 12, 2160.

Zhang, Chunzi; Gunes, Ozan; Li, Yuanshi; Cui, Xiaoyu; Mohammadtaheri, Masoud; Wen, Shi-Jie; Wong, Rick; Yang, Qiaoqin; Kasap, Safa.

Afiliación

Zhang C; Department of Electrical and Computer Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada.
Gunes O; Department of Electrical and Computer Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada.
Li Y; Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada.
Cui X; Canadian Light Source Inc., 44 Innovation Boulevard, Saskatoon, SK S7N 2V3, Canada.
Mohammadtaheri M; Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada.
Wen SJ; Cisco Systems Inc., San Jose, CA 95134, USA.
Wong R; Cisco Systems Inc., San Jose, CA 95134, USA.
Yang Q; Department of Mechanical Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada.
Kasap S; Department of Electrical and Computer Engineering, University of Saskatchewan, 57 Campus Drive, Saskatoon, SK S7N 5A9, Canada.

Materials (Basel) ; 13(22)2020 Nov 13.

Article en En | MEDLINE | ID: mdl-33203063

Texto completo

Imprimir

XML

PubMed Links

Buscar en Google

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Materials (Basel) Año: 2020 Tipo del documento: Article País de afiliación: Canadá

Texto completo

Imprimir

XML

PubMed Links

Buscar en Google