Computational molecular-level prediction of heterocyclic compound-metal surface interfacial behavior.

Chaouiki, Abdelkarim; In Han, Da; Ko, Young Gun

Chaouiki, Abdelkarim; In Han, Da; Ko, Young Gun.

Afiliación

Chaouiki A; Materials Electrochemistry Group, School of Materials Science and Engineering, Yeungnam University, Gyeongsan 38541, Republic of Korea.
In Han D; Materials Electrochemistry Group, School of Materials Science and Engineering, Yeungnam University, Gyeongsan 38541, Republic of Korea.
Ko YG; Materials Electrochemistry Group, School of Materials Science and Engineering, Yeungnam University, Gyeongsan 38541, Republic of Korea. Electronic address: younggun@ynu.ac.kr.

J Colloid Interface Sci ; 622: 452-468, 2022 Sep 15.

Article en En | MEDLINE | ID: mdl-35525147

Asunto(s)

Compuestos Heterocíclicos; Nitrofuranos; Adsorción; Corrosión; Metales; Compuestos de Sulfhidrilo

Palabras clave

Computational perspective; Corrosion protection; Heterocyclic compound; Interfacial mechanism; Molecular-level

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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Asunto principal: Compuestos Heterocíclicos / Nitrofuranos Tipo de estudio: Prognostic_studies / Risk_factors_studies Idioma: En Revista: J Colloid Interface Sci Año: 2022 Tipo del documento: Article

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