RESUMEN
We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370 nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8 W/cm2 per imaged pixel in circular spots of diameter approximately 8 microm. We show example structures written in positive as well as in negative photoresist.
Asunto(s)
Iluminación/instrumentación , Materiales Manufacturados/efectos de la radiación , Fotoquímica/instrumentación , Fotograbar/instrumentación , Semiconductores , Diseño Asistido por Computadora , Diseño de Equipo , Análisis de Falla de Equipo , Miniaturización , Rayos UltravioletaRESUMEN
A mass sensor innovative concept is presented here, based on a hollow plate Micro Electro Mechanical System (MEMS) resonator. This approach consists in running a solution through an embedded microchannel, while the plate resonator is actuated according to a Lamé-mode by electrostatic coupling in dry environment. The experimental results have shown a clear relationship between the measured shift of the resonance frequency and the sample solution density. Additionally, depending on the channel design and the solution properties, the quality factor (Q-factor) was noticed maintaining its level and even substantial improvement in particular cases. Resonators demonstrate resonance frequencies close to 78 MHz and Q-factor of a few thousands for liquid phase detection operating at ambient temperature and atmospheric pressure. Frequency fluctuations study revealed a 13 Hz instability level, equivalent to 1.5 fg in mass. Using a fully electronic readout configuration, a mass responsivity of ca. 850 fg kHz(-1) was monitored.